J
Jibin Zou
Researcher at Peking University
Publications - 47
Citations - 526
Jibin Zou is an academic researcher from Peking University. The author has contributed to research in topics: Field-effect transistor & Gate dielectric. The author has an hindex of 12, co-authored 47 publications receiving 454 citations. Previous affiliations of Jibin Zou include Oracle Corporation & National Institute of Standards and Technology.
Papers
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Journal ArticleDOI
Investigation on Variability in Metal-Gate Si Nanowire MOSFETs: Analysis of Variation Sources and Experimental Characterization
TL;DR: In this article, the characteristics of gate-all-around (GAA) Si nanowire (NW) metal-oxide-semiconductor field effect transistors (SNWTs) are analyzed and experimentally investigated.
Journal ArticleDOI
Impacts of Random Telegraph Noise (RTN) on Digital Circuits
TL;DR: In this paper, a simulation approach that fully integrates the dynamic properties of ac trap effects is presented for accurate simulation of RTN in digital circuits, e.g., failure probabilities of SRAM cells and jitters of ring oscillators, are then evaluated by the simulations and verified against predictions based on the ac trap occupancy probability.
Journal ArticleDOI
Predictive 3-D Modeling of Parasitic Gate Capacitance in Gate-all-Around Cylindrical Silicon Nanowire MOSFETs
TL;DR: In this article, an analytical model for parasitic gate capacitances in gate-all-around cylindrical silicon nanowire MOSFETs is developed for the first time.
Proceedings ArticleDOI
New insights into AC RTN in scaled high-к / metal-gate MOSFETs under digital circuit operations
Jibin Zou,Runsheng Wang,Nanbo Gong,Ru Huang,Xiaoqing Xu,Jiaojiao Ou,Changze Liu,Jianping Wang,Jinhua Liu,Jingang Wu,Shaofeng Yu,Pengpeng Ren,Hanming Wu,Shiuh-Wuu Lee,Yangyuan Wang +14 more
TL;DR: It is found that the AC RTN statistics largely deviates from traditional DC RTN, in terms of different distribution functions and the strong dependence on AC signal frequency, which directly impacts on the accurate prediction of circuit stability and variability.
Proceedings ArticleDOI
A unified approach for trap-aware device/circuit co-design in nanoscale CMOS technology
Runsheng Wang,Mulong Luo,Shaofeng Guo,Ru Huang,Changze Liu,Jibin Zou,Jianping Wang,Jingang Wu,Nuo Xu,Waisum Wong,Scott Yu,Hanming Wu,Shiuh-Wuu Lee,Yangyuan Wang +13 more
TL;DR: In this paper, the major physical effects caused by gate oxide traps in MOSFETs have been integrated for the first time by a proposed unified approach in realistic manners based on industry-standard EDA tools, aiming at practical trap-aware device/circuit co-design.