scispace - formally typeset
J

Jibin Zou

Researcher at Peking University

Publications -  47
Citations -  526

Jibin Zou is an academic researcher from Peking University. The author has contributed to research in topics: Field-effect transistor & Gate dielectric. The author has an hindex of 12, co-authored 47 publications receiving 454 citations. Previous affiliations of Jibin Zou include Oracle Corporation & National Institute of Standards and Technology.

Papers
More filters
Journal ArticleDOI

Investigation on Variability in Metal-Gate Si Nanowire MOSFETs: Analysis of Variation Sources and Experimental Characterization

TL;DR: In this article, the characteristics of gate-all-around (GAA) Si nanowire (NW) metal-oxide-semiconductor field effect transistors (SNWTs) are analyzed and experimentally investigated.
Journal ArticleDOI

Impacts of Random Telegraph Noise (RTN) on Digital Circuits

TL;DR: In this paper, a simulation approach that fully integrates the dynamic properties of ac trap effects is presented for accurate simulation of RTN in digital circuits, e.g., failure probabilities of SRAM cells and jitters of ring oscillators, are then evaluated by the simulations and verified against predictions based on the ac trap occupancy probability.
Journal ArticleDOI

Predictive 3-D Modeling of Parasitic Gate Capacitance in Gate-all-Around Cylindrical Silicon Nanowire MOSFETs

TL;DR: In this article, an analytical model for parasitic gate capacitances in gate-all-around cylindrical silicon nanowire MOSFETs is developed for the first time.
Proceedings ArticleDOI

New insights into AC RTN in scaled high-к / metal-gate MOSFETs under digital circuit operations

TL;DR: It is found that the AC RTN statistics largely deviates from traditional DC RTN, in terms of different distribution functions and the strong dependence on AC signal frequency, which directly impacts on the accurate prediction of circuit stability and variability.
Proceedings ArticleDOI

A unified approach for trap-aware device/circuit co-design in nanoscale CMOS technology

TL;DR: In this paper, the major physical effects caused by gate oxide traps in MOSFETs have been integrated for the first time by a proposed unified approach in realistic manners based on industry-standard EDA tools, aiming at practical trap-aware device/circuit co-design.