Author
Jindřich Musil
Other affiliations: Academy of Sciences of the Czech Republic, Tomsk Polytechnic University, Czechoslovak Academy of Sciences
Bio: Jindřich Musil is an academic researcher from University of West Bohemia. The author has contributed to research in topics: Sputter deposition & Sputtering. The author has an hindex of 44, co-authored 180 publications receiving 7866 citations. Previous affiliations of Jindřich Musil include Academy of Sciences of the Czech Republic & Tomsk Polytechnic University.
Papers published on a yearly basis
Papers
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TL;DR: In this article, the development of hard coatings from a titanium nitride film through superlattice coatings to nanocomposite coatings is reviewed, and significant attention is devoted to hard and superhard single layer nano-coating.
Abstract: This article reviews the development of hard coatings from a titanium nitride film through superlattice coatings to nanocomposite coatings. Significant attention is devoted to hard and superhard single layer nanocomposite coatings. A strong correlation between the hardness and structure of nanocomposite coatings is discussed in detail. Trends in development of hard nanocomposite coatings are also outlined.
955 citations
TL;DR: In this paper, an assessment of the mechanical behavior of hard and superhard nanocomposite coatings from loading/unloading curves measured by a computer-controlled Fischerscope H 100 microhardness tester and a maximum depth d max of the diamond indenter impression into the coating at a given load L.
Abstract: The paper is devoted to an assessment of the mechanical behavior of hard and superhard nanocomposite coatings from loading/unloading curves measured by a computer-controlled Fischerscope H 100 microhardness tester and a maximum depth d max of the diamond indenter impression into the coating at a given load L . It is shown that: (1) the area between the loading/unloading curve and the value of d max decreases with increasing (i) hardness H , (ii) effective Young's modulus E * = E /(1−ν 2 ) and (iii) universal hardness HU, where E and ν are the Young's modulus and the Poisson ratio, respectively; and (2) there is no simple relation between the mechanical response of the coating and H or E * alone; however, this response is strongly dependent on the ratio H / E * . The last fact gives a possibility of tailoring the mechanical properties of a coating for a given application, e.g. to prepare coatings with high hardness H , high resistance to plastic deformation (∼ H 3 / E *2 ), high elastic recovery W e , but with low E * and high d max . Special attention is also given to the analysis of problems in accurately measuring the hardness of superhard (≥60 GPa) coatings. It is shown that a high elastic recovery W e ≥80% of superhard films with H ≥60 GPa (1) strongly decreases the gradient d H /d L and (2) shifts the region L , where H ( L )≈constant and the hardness H is correctly measured, to higher values of L . This means that the lowest load L used in the hardness measurement must be higher than L used in measurements of coatings with H H measured from being significantly higher than the real hardness of the coating.
576 citations
TL;DR: A critical review of the present state of the knowledge in the field of dc reactive magnetron sputtering of compound films is given in this article, where the conditions under which oxides are reactively sputtered with high deposition rates aD oxide achieving up to approximately 77% of that of a pure metal aD Me.
346 citations
TL;DR: In this paper, the authors investigated the relationship between the cracking of hard, 3-5-μm-thick Zr-Cu-O, Zr−Cu-C, Ti-Cu−C and Si-Me-N using microindentation measurements and found that the resistance of the film to cracking increases with increasing ratio Hf3/Efµ2.
Abstract: This article reports on the investigation of cracking of hard, 3–5 μm thick Zr–Cu–O, Zr–Cu–C, Ti–Cu–C and Si–Me–N (Me = Ta, Zr, Mo, W) magnetron sputtered nanostructured films using microindentation measurements. Main aim of this investigation is to determine the interrelationships between the cracking of film, its structure and mechanical properties and to assess the toughness of thin film. Correlations between the formation of cracks, the mechanical properties of film and substrate, structure of film and macrostress σ generated in the film during its growth were investigated in detail. It was found that the resistance of the film to cracking increases with increasing ratio Hf3/Ef⁎2. It was found that (1) the correct assessment of toughness of the thin film requires to investigate the system thin film/substrate as one unit because mechanical properties of the substrate play a decisive role in the formation of cracks, (2) the strongest parameter influencing the formation of cracks is the film structure and its macrostress σ and (3) nanostructured films with X-ray amorphous structure and small compressive macrostress (σ ≈ − 0.1 GPa) are very stable against the cracking even at high values of the film hardness Hf exceeding 20 GPa.
301 citations
TL;DR: In this paper, a planar round unbalanced magnetron of 100 mm in diameter was used to produce superhard (≥40 GPa) films with hardness of up to 47 GPa.
250 citations
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TL;DR: In this article, the authors discuss the concept of nanocomposite coatings with high hardness and low elastic modulus, which can exhibit improved toughness, and are therefore better suited for optimising the wear resistance of real industrial substrate materials (i.e., steels and light alloys, with similarly low moduli).
2,252 citations
TL;DR: Magnetron sputtering has become the process of choice for the deposition of a wide range of industrially important coatings, such as hard, wear-resistant, low friction, corrosion resistant, and decorative coatings as discussed by the authors.
1,640 citations
TL;DR: In this paper, the authors review the present understanding of film growth processes and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth.
Abstract: Atomic-scale control and manipulation of the microstructure of polycrystalline thin films during kinetically limited low-temperature deposition, crucial for a broad range of industrial applications, has been a leading goal of materials science during the past decades. Here, we review the present understanding of film growth processes—nucleation, coalescence, competitive grain growth, and recrystallization—and their role in microstructural evolution as a function of deposition variables including temperature, the presence of reactive species, and the use of low-energy ion irradiation during growth.
1,499 citations
TL;DR: Transparent conductors (TCs) have a multitude of applications for solar energy utilization and for energy savings, especially in buildings as discussed by the authors, which leads naturally to considerations of spectral selectivity, angular selectivity, and temporal variability of TCs, as covered in three subsequent sections.
1,471 citations
TL;DR: A review of the development of high performance polyurethane (PU) and its subclass coatings can be found in this paper, where a wide variety of fillers, whiskers and fibers as well as clay and wollastonites with structural modification are described for use in nanocomposite PU coatings.
1,434 citations