Johan Böhlmark

TL;DR: In this article, the development and application of magnetron sputtering systems for ionized physical vapor deposition (IPVD) is reviewed, and the application of a secondary discharge, inductively coupled plasma magnetron (ICP-MS), microwave amplified magnetron, and self-sustained sputtering (SSS) is discussed as well as the hollow cathode magnetron discharges.

TL;DR: In this paper, the energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas was reported for a high power impulse magnetron sputtering (HIPIMS) discharge.

TL;DR: In this article, the ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron sputtering and compared with a continuous direct current discharge using the same experimental setup except for the power source.

TL;DR: In this article, the authors synthesized Ta thin films on Si substrates placed along a wall of a 2 cm-deep and 1 cm-wide trench, using both a mostly neutral Ta flux by conventional dc magnetron sputtering (dcMS) and a mostly ionized Ta flux (HPPMS) by high-power pulsed magnetron stuttering.

TL;DR: In this paper, a surface pretreatment by the novel high power impulse magnetron sputtering (HIPIMS) technique followed by reactive unbalanced d.c. ma...