Author
Jon M. Andersson
Bio: Jon M. Andersson is an academic researcher from Linköping University. The author has contributed to research in topics: Thin film & Sputtering. The author has an hindex of 10, co-authored 13 publications receiving 534 citations.
Topics: Thin film, Sputtering, Materials science, Sputter deposition, Metallurgy
Papers
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TL;DR: In this paper, radio frequency sputtering has been used to deposit α-alumina (α-Al2O3) thin films at substrate temperatures of 280-560°C.
Abstract: Radio frequency sputtering has been used to deposit α-alumina (α-Al2O3) thin films at substrate temperatures of 280–560 °C. The films are shown to be single phased and hard. Nanoindentation gives values of 306±31 and 27±3 GPa for elastic modulus and hardness, respectively, for a substrate temperature of 280 °C. Growth of the α phase was achieved by in situ predeposition of a chromia template layer. Chromia crystallizes in the same hexagonal structure as α-alumina, with a lattice mismatch of 4.1% in the a- and 4.6% in the c-parameter, and is shown to nucleate readily on the amorphous substrates (silicon with a natural oxide layer). This results in local epitaxy of α-alumina on the chromia layer, as is shown by transmission electron microscopy. The alumina grains are columnar with grain widths increasing from 22±7 to 41±9 nm, as the temperature increases from 280 to 560 °C. This is consistent with a surface diffusion dominated growth mode and suggests that α-alumina deposition at low temperatures is possibl...
106 citations
TL;DR: In this article, high power impulse magnetron sputtering (HIPIMS), an ionized physical vapor deposition technique, was used to grow thin films on Si substrates at different inclination angles with respect to the sputter source.
106 citations
TL;DR: In this paper, a low-temperature growth of α-Al2O3 thin films by reactive magnetron sputtering was achieved for the first time, and the films were grown onto Cr2O 3 nucleation layers and the effects of the tota...
87 citations
TL;DR: In this paper, the ion flux obtained during reactive magnetron sputtering of an Al target in Ar/O2 gas mixtures was studied by energy-resolved mass spectrometry, as a function of the total and O2 partial pressure.
Abstract: The ion flux obtained during reactive magnetron sputtering of an Al target in Ar/O2 gas mixtures was studied by energy-resolved mass spectrometry, as a function of the total and O2 partial pressure ...
53 citations
TL;DR: In this paper, the interactions of Al, O, and O2 with different α-Al2O3 (0001) surfaces have been studied using ab initio density functional theory methods.
Abstract: The interactions of Al, O, and O2 with different α- Al2O3 (0001) surfaces have been studied using ab initio density functional theory methods. All three surface terminations obtainable by cleaving ...
43 citations
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TL;DR: A critical review of the M(n + 1)AX(n) phases from a materials science perspective is given in this article, where the authors discuss the potential for low-temperature synthesis, which is essential for deposition of MAX phases onto technologically important substrates.
905 citations
TL;DR: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike as discussed by the authors, also known as HIPIMS (high power impulse...
Abstract: High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has gained substantial interest among academics and industrials alike. HPPMS, also known as HIPIMS (high power impulse ...
846 citations
TL;DR: In this article, an extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering.
630 citations
TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.
Abstract: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulse ...
586 citations
TL;DR: In this paper, a new ab initio entropy descriptor was developed to assist in selection of candidate compositions for synthesis of high entropy and entropy stabilized carbides. But the proposed descriptor is not suitable for high-energy ball milling and spark plasma sintering.
380 citations