J
Juntao Li
Researcher at China Academy of Engineering Physics
Publications - 34
Citations - 325
Juntao Li is an academic researcher from China Academy of Engineering Physics. The author has contributed to research in topics: Silicon carbide & Breakdown voltage. The author has an hindex of 8, co-authored 31 publications receiving 209 citations.
Papers
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Journal ArticleDOI
Investigations on the Degradation of 1.2-kV 4H-SiC MOSFETs Under Repetitive Short-Circuit Tests
TL;DR: In this article, the failure mechanism of commercial 1.2-kV SiC MOFSETs under repetitive short-circuit (SC) tests has been investigated, where relatively low stress defined as low bias voltage and short SC duration is imposed on the devices, eliminating the effect of gate oxide degradation and metal deterioration.
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A Deep Insight Into the Degradation of 1.2-kV 4H-SiC mosfets Under Repetitive Unclamped Inductive Switching Stresses
TL;DR: In this article, the long-term reliability of commercial 1.2-kV 4H-SiC mofset s under repetitive unclamped inductive switching stresses is evaluated experimentally.
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4H-SiC Trench MOSFET With Floating/Grounded Junction Barrier-controlled Gate Structure
TL;DR: In this paper, a novel silicon carbide (SiC) trench MOSFET with floating/grounded junction barrier-controlled gate structure (FJB-MOS) was presented and investigated utilizing Sentaurus TCAD simulations.
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Characterization and Performance Evaluation of the Superjunction RB-IGBT in Matrix Converter
TL;DR: In this article, the performance of the three-phase ac-ac matrix converter (MC) utilizing the novel superjunction (SJ) reverse-blocking (RB)-insulated gate bipolar transistor (IGBT) as switch elements for the first time was investigated.
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A Multiple-Ring-Modulated JTE Technique for 4H-SiC Power Device With Improved JTE-Dose Window
TL;DR: In this article, a multiple-ring-modulated junction termination extension (MRM-JTE) technology for large-area silicon carbide PiN rectifier rated at 4500 V is proposed and experimentally investigated using a standard two-zone JTE (TZ-jTE) process without extra process steps or masks.