Showing papers by "Kamaljit Rangra published in 2000"
TL;DR: In this article, the formation of unsupported resist microfragments called resist debris (RD) over the exposed pattern areas in EBL is found to predict proximity exposure (PE) effects.
Abstract: Deliberate formation of unsupported resist microfragments called resist debris (RD) over the exposed pattern areas in electron beam lithography (EBL) is found to predict proximity exposure (PE) effects. Some simulation results and corresponding experimental results on RD formation discussed in the article show that both intra- and interpattern PE effects can be observed and explained from the nature of RD distribution. This gives a different kind of tool to tackle the problem of PE effect in EBL.
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