Kamaljit Rangra

Bio: Kamaljit Rangra is an academic researcher from Indian Institute of Technology, Jodhpur. The author has contributed to research in topics: Insertion loss & Capacitive sensing. The author has an hindex of 11, co-authored 80 publications receiving 511 citations. Previous affiliations of Kamaljit Rangra include University of Trento & The National Academy of Sciences, India.

Low Cost Alloy Deposition for High Power Applications

Abstract: In this paper, we have reported a low cost method for depositing the hard alloy materials for electrical contact as well as MEMS structure application. Conventional methods of deposition like co-sputtering, e-beam PVD, etc. required a high running cost and had a high waste generation due to poor selectivity of deposition. The alloy formation was performed using a novel Electroplating method of synthesis. Au–Co alloy is made using a single bath electrodeposition for Au–Co thin films. XRD peaks analysis was used to confirm the alloy formation. AFM analysis was used to study the grains size, and surface roughness and the hardness measurement was performed using micro-indentation. The less surface roughness and high strength (Hardened) gold alloy formation were observed for a neutral pH (6.6 pH) Au–Co Alloy electroplating conditions. The low pH (4.0 pH) solution results to higher surface roughness while higher pH of the solution was not suitable for Au electroplating.

A MEMS disk resonator-based band pass filter electrical equivalent circuit simulation

Abstract: In this paper, coupled beam bandpass Disk filter is designed for 1 MHz bandwidth. Filter electrical equivalent circuit simulation is performed using circuit simulators. Important filter parameters such as insertion loss, shape factor and Q factor aresetimated using coventorware simulation. Disk resonator based radial contour mode filter provides 1.5 MHz bandwidth and unloaded quality factor of resonator and filter as 233480, 21797 respectively. From the simulation result it’s found that insertion loss minimum is 151.49 dB, insertion loss maximum is 213.94 dB, and 40 dB shape factor is 4.17.

Optimization of Physical Dimensions of Mach Zehnder Interferometer for Biosensing Application

Abstract: This work presents the design aspects of Mach Zehnder Interferometer (MZI) based biosensors for bio-molecular detection. The effects of physical dimensions in the wave propagation in a Mach Zehnder Interferometer (MZI) has been studied using Comsol Multiphysics software. The design is proposed for development of biosensor for detection of lipoarabinomannan (LAM) antigen. The MZI structure has been realized using Y-junctions with s-bend configuration and cut-off bend radius is determined. This study is required for nanoscale fabrication and to achieve high sensitivity in biosensing application especially in detection of TB in early stages through urine samples.

A Photodetector-based Automated Light Intensity Controlling System using IoT

Abstract: Applications of photo detectors in various areas have greatly motivated its research and development. This paper reports a heterojunction based porous silicon (PS) and TiO2hetero junction of the type of gold-PS-TiO2-gold (metal semiconductor metal) structure. The response of the photo detector is tested in presence of room light, flash light and laser (wavelength between 630–670 nm) and sensitivity is found to be 66.66%, 84% and 126% respectively. Other sensor parameters have also been studied; for example, responsivity, response and recovery time. Further, the sensor output is integrated to a cloud-based IoT platform. A demonstration of sensing and control in an IoT network with use of a photodetector has been portrayed. This type of arrangement is found to be beneficial for applications where frequent human intervention is not possible.

Design and pull-in voltage optimization of series metal-to-metal contact RF MEMS switch

Abstract: This paper presents the design, analysis and simulation of metal-to metal contact series rf-MEMS switch for its pull-in voltage optimization Fixed — fixed flexure is used as a switching element and the Pull-in voltage is optimized for generating a force to obtain a stable contact resistance Au is used as the contact material The simulated value of the pull-in voltage (V pi ) is approximately 1020 V At the pull-in voltage the area occupied under contact is 889 µm2 and the value of contact force is 184 µN The switch pull-in voltage value is optimized at a value of 23 V giving contact area of 924 µm2 and contact force of 3155 µN

I and i

Abstract: There is, I think, something ethereal about i —the square root of minus one. I remember first hearing about it at school. It seemed an odd beast at that time—an intruder hovering on the edge of reality. Usually familiarity dulls this sense of the bizarre, but in the case of i it was the reverse: over the years the sense of its surreal nature intensified. It seemed that it was impossible to write mathematics that described the real world in …

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

Abstract: We investigate poly(methylmethacrylate) (PMMA) development processing with cold developers (4–10 °C) for its effect on resolution, resist residue, and pattern quality of sub-10 nm electron beam lithography (EBL). We find that low-temperature development results in higher EBL resolution and improved feature quality. PMMA trenches of 4–8 nm are obtained reproducibly at 30 kV using cold development. Fabrication of single-particle-width Au nanoparticle lines was performed by lift-off. We discuss key factors for formation of PMMA trenches at the sub-10 nm scale.

What is Design and Technology

Abstract: Design and technology is an inspiring, rigorous and practical subject. Using creativity and imagination, pupils design and make products that solve real and relevant problems within a variety of contexts, considering their own and others’ needs, wants and values. They acquire a broad range of subject knowledge and draw on disciplines such as mathematics, science, engineering, computing and art. Pupils learn how to take risks, becoming resourceful, innovative, enterprising and capable citizens. Through the evaluation of past and present design and technology, they develop a critical understanding of its impact on daily life and the wider world. High-quality design and technology education makes an essential contribution to the creativity, culture, wealth and well-being of the nation.