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Kamaljit Rangra

Researcher at Indian Institute of Technology, Jodhpur

Publications -  84
Citations -  635

Kamaljit Rangra is an academic researcher from Indian Institute of Technology, Jodhpur. The author has contributed to research in topics: Insertion loss & Capacitive sensing. The author has an hindex of 11, co-authored 80 publications receiving 511 citations. Previous affiliations of Kamaljit Rangra include University of Trento & The National Academy of Sciences, India.

Papers
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Journal ArticleDOI

Resist debris formation in electron beam lithography

TL;DR: In this paper, the authors theoretically and experimentally investigated the resist debris formation dependence on beam stepping to beam size ratio in electron beam lithography (EBL) and showed that this undesirable phenomenon of RD formation gives another dimension to look at the problem of proximity exposure effect in EBL.
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Improved isolation RF MEMS switch with post release ashing

TL;DR: In this paper, a mixed release process of wet and dry is presented to release the stiction free suspended microstructures, which is removed by plasma cleaning, which improves the isolation of the device under test to 22 dB from 15 dB after plasma exposure.
Proceedings ArticleDOI

Micromachined low actuation voltage RF MEMS capacitive switches, technology and characterization

TL;DR: In this article, a low-loss, capacitive RF MEMS switches that utilize folded serpentine spring suspensions with large area actuation electrodes are implemented in standard 50 ohm CPW configuration.
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Effect of Parasitic Capacitance on RF MEMS Switch OFF/ON Ratio

TL;DR: In this article, the authors extracted the RF MEMS capacitive switch LCR parameters considering parasitic capacitance to explain the mismatch of measured results, which is a function of switch geometry and directly proportional to dielectric constant of the substrate material.
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Efficient thermal utilization in MEMS bulk micromachined pyroelectric infrared sensor using thermal oxide thin layer

TL;DR: In this article, the authors proposed use of micromachined SiO2 thin membrane as thermal insulation layer in bulk micromACHined pyroelectric infrared sensor. And the study is supported by the comparative radiation heat transfer, finite element analysis and the practical thermal measurements on fabricated pyro electric infrared sensor using non destructive thermal imaging method.