scispace - formally typeset
L

Luis A. Jauregui

Researcher at Harvard University

Publications -  80
Citations -  7850

Luis A. Jauregui is an academic researcher from Harvard University. The author has contributed to research in topics: Graphene & Polariton. The author has an hindex of 34, co-authored 77 publications receiving 6860 citations. Previous affiliations of Luis A. Jauregui include University of California, Irvine & Purdue University.

Papers
More filters
Journal ArticleDOI

Control and characterization of individual grains and grain boundaries in graphene grown by chemical vapour deposition

TL;DR: It is shown that grain boundaries give a significant Raman 'D' peak, impede electrical transport, and induce prominent weak localization indicative of intervalley scattering in graphene, opening a route towards scalable fabrication of single-crystal graphene devices without grain boundaries.
Journal ArticleDOI

Control and Characterization of Individual Grains and Grain Boundaries in Graphene Grown by Chemical Vapor Deposition

TL;DR: In this paper, single-crystal graphene grains synthesized by ambient CVD on polycrystalline Cu are studied and individual boundaries between coalescing grains affect graphene's electronic properties.
Journal ArticleDOI

Probing dark excitons in atomically thin semiconductors via near-field coupling to surface plasmon polaritons

TL;DR: The SPP-based near-field spectroscopy significantly improves experimental capabilities for probing and manipulating exciton dynamics of atomically thin materials, thus opening up new avenues for realizing active metasurfaces and robust optoelectronic systems, with potential applications in information processing and communication.
Journal ArticleDOI

Rational synthesis of ultrathin n-type Bi2Te3 nanowires with enhanced thermoelectric properties.

TL;DR: The uniformity and high yield of the nanowires provide a promising route to make significant contributions to the manufacture of nanotechnology-based thermoelectric power generation and solid-state cooling devices with superior performance in a reliable and a reproducible way.
Journal ArticleDOI

Effect of oxygen plasma etching on graphene studied using Raman spectroscopy and electronic transport measurements

TL;DR: In this paper, the intensity ratio between Raman 'D' and 'G' peaks, ID/IG (commonly used to characterize disorder in graphene), is observed to initially increase almost linearly with the number (Ne) of plasma-etching pulses, but later decreases at higher Ne values.