M
Marcus Müller
Researcher at University of Göttingen
Publications - 512
Citations - 24112
Marcus Müller is an academic researcher from University of Göttingen. The author has contributed to research in topics: Monte Carlo method & Wetting. The author has an hindex of 72, co-authored 469 publications receiving 21939 citations. Previous affiliations of Marcus Müller include University of Mainz & University of Washington.
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Journal ArticleDOI
Emerging applications of stimuli-responsive polymer materials
Martien A. Cohen Stuart,Wilhelm T. S. Huck,Jan Genzer,Marcus Müller,Christopher K. Ober,Manfred Stamm,Gleb B. Sukhorukov,Igal Szleifer,Vladimir V. Tsukruk,Marek W. Urban,Françoise M. Winnik,Stefan Zauscher,Igor Luzinov,Sergiy Minko +13 more
TL;DR: This work reviews recent advances and challenges in the developments towards applications of stimuli-responsive polymeric materials that are self-assembled from nanostructured building blocks and provides a critical outline of emerging developments.
Journal ArticleDOI
Directed assembly of block copolymer blends into nonregular device-oriented structures.
Mark P. Stoykovich,Marcus Müller,Sang Ouk Kim,Harun H. Solak,Erik Edwards,Juan J. de Pablo,Paul F. Nealey +6 more
TL;DR: Ternary blends of diblock copolymers and homopolymers that naturally form periodic arrays are directed to assemble into nonregular device-oriented structures on chemically nanopatterned substrates for defect-free assembly in locations where the domain dimensions deviate substantially from those formed in the bulk.
Directed self-assembly of block copolymer blends into nonregular device-oriented structures
Mark P. Stoykovich,Marcus Müller,Sang Ouk Kim,Harun H. Solak,Erik W. Edwards,J. J. de Pablo,Paul F. Nealey +6 more
Journal ArticleDOI
Two-Level Structured Self-Adaptive Surfaces with Reversibly Tunable Properties
TL;DR: A route to fabricate two-level structured self-adaptive surfaces (SAS) of polymer materials that enables us to control wettability, adhesion, and chemical composition of the surface over a wide range is reported.
Journal ArticleDOI
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries.
Mark P. Stoykovich,Huiman Kang,Kostas Ch. Daoulas,Guoliang Liu,Chi-Chun Liu,Juan J. de Pablo,Marcus Müller,Paul F. Nealey +7 more
TL;DR: It is shown that the domain structure of block copolymers in thin films can be directed to assemble into nearly the complete set of essential dense and isolated patterns as currently defined by the semiconductor industry.