Matthew E. Colburn

TL;DR: In this article, a template is created on a standard mask blank by using the patterned chromium as an etch mask to produce high-resolution relief images in the quartz.

TL;DR: In this paper, an automated tool for step and flash imprint lithography was constructed to allow defect studies by making multiple imprints on a 200 mm wafer, and the imprint templates for this study were treated with a low surface energy, self-assembled monolayer to ensure selective release at the template-etch barrier interface.

TL;DR: Target applications including surface-roughening for on-chip decoupling capacitors, patterning nanocrystal floating gates for FLASH devices, and defining FET channel arrays are discussed.

TL;DR: In this paper, a method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable fluids composition with a mold having a relief structure formed therein such that the polymerisable fluid composition filled the relief structure in the mold.

TL;DR: In this article, imprint lithography templates are used to form an imprinted layer in a light curable liquid disposed on a substrate, and during use, the template may be disposed within a template holder.