M
Maurizio Passacantando
Researcher at University of L'Aquila
Publications - 262
Citations - 7239
Maurizio Passacantando is an academic researcher from University of L'Aquila. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Thin film. The author has an hindex of 44, co-authored 251 publications receiving 6245 citations.
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XPS study of the surface chemistry of L-CVD SnO2 thin films after oxidation
TL;DR: In this article, the surface chemistry of L-CVD SnO2 thin films on Si(100) before and after subsequent additional oxidation was studied. And the ageing effect was also checked in order to check the influence of ambient oxidation.
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XPS studies on SiOx thin films
TL;DR: In this article, the surface stoichiometry of SiO x thin films (x = 1-2) has been studied by means of X-ray photoelectron spectroscopy, and the presence of three Si oxidation states (SiO 2, SiO, Si 2 O 3 ) has been observed through an analysis of the Si2p line shape and the intensity variation of these different silicon oxide signals, as a function of the oxygen content.
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NO2 sensitivity of WO3 thin film obtained by high vacuum thermal evaporation
Carlo Cantalini,Hong-Tao Sun,Marco Faccio,Mario Pelino,Sandro Santucci,Luca Lozzi,Maurizio Passacantando +6 more
TL;DR: In this paper, the gas sensitivity, selectivity and stability properties of WO 3 thin films for the detection of NO 2 gas in the concentration range 0.2 -5 ppm, have been evaluated and discussed in the light of the preparation conditions and working temperature.
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Comparison of single and binary oxide MoO3, TiO2 and WO3 sol–gel gas sensors
Kosmas Galatsis,Yongxiang Li,Wojtek Wlodarski,Elisabetta Comini,Giorgio Sberveglieri,Carlo Cantalini,Sandro Santucci,Maurizio Passacantando +7 more
TL;DR: In this article, a comparison of sol-gel prepared TiO2, WO3, and MoO3 single metal oxide based gas sensors was conducted Sensors based on binary compound MoO 3-TiO2 and Mo O 3-WO3 were also compared where the performance is superior to their single oxide constituents.
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Investigation on the O3 sensitivity properties of WO3 thin films prepared by sol–gel, thermal evaporation and r.f. sputtering techniques
Carlo Cantalini,Wojtek Wlodarski,Yongxiang Li,Maurizio Passacantando,Sandro Santucci,Elisabetta Comini,Guido Faglia,Giorgio Sberveglieri +7 more
TL;DR: In this article, WO3 thin films have been deposited on alumina substrates provided with platinum interdigital electrodes by sol-gel (SG), r.f. sputtering (RFS), and vacuum thermal evaporation (VTE) techniques and annealed at temperatures between 500°C and 600°C for 1 to 30 h in static air.