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Maziar Farahmand

Bio: Maziar Farahmand is an academic researcher from Georgia Institute of Technology. The author has contributed to research in topics: Wurtzite crystal structure & Monte Carlo method. The author has an hindex of 6, co-authored 11 publications receiving 789 citations.

Papers
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Journal ArticleDOI
TL;DR: In this paper, a comprehensive study of the transport dynamics of electrons in the ternary compounds, Al/sub x/Ga/sub 1-x/N and In/sub ng/g/ng/s/n g/n/g n/g 1.x/n, is presented, which includes all of the major scattering mechanisms.
Abstract: We present a comprehensive study of the transport dynamics of electrons in the ternary compounds, Al/sub x/Ga/sub 1-x/N and In/sub x/Ga/sub 1-x/N. Calculations are made using a nonparabolic effective mass energy band model. Monte Carlo simulation that includes all of the major scattering mechanisms. The band parameters used in the simulation are extracted from optimized pseudopotential band calculations to ensure excellent agreement with experimental information and ab initio band models. The effects of alloy scattering on the electron transport physics are examined. The steady state velocity field curves and low field mobilities are calculated for representative compositions of these alloys at different temperatures and ionized impurity concentrations. A field dependent mobility model is provided for both ternary compounds AlGaN and InGaN. The parameters for the low and high field mobility models for these ternary compounds are extracted and presented. The mobility models can be employed in simulations of devices that incorporate the ternary III-nitrides.

421 citations

Journal ArticleDOI
TL;DR: In this article, Monte Carlo simulations of electron transport based upon an analytical representation of the lowest conduction bands of bulk, wurtzite phase GaN are used to develop a set of transport parameters for devices with electron conduction in GaN.
Abstract: Monte Carlo simulations of electron transport based upon an analytical representation of the lowest conduction bands of bulk, wurtzite phase GaN are used to develop a set of transport parameters for devices with electron conduction in GaN. Analytic expressions for spherical, nonparabolic conduction band valleys at the Γ, U, M, and K symmetry points of the Brillouin zone are matched to experimental effective mass data and to a pseudopotential band structure. The low-field electron drift mobility is calculated for temperatures in the range of 300–600 K and for ionized impurity concentrations between 1016 and 1018 cm−3. Compensation effects on the mobility are also examined. Electron drift velocities for fields up to 500 kV/cm are calculated for the above temperature range. To aid GaN device modeling, the drift mobility dependences on ambient temperature, donor concentration, and compensation ratio are expressed in analytic form with parameters determined from the Monte Carlo results. Analytic forms are also...

326 citations

Journal ArticleDOI
TL;DR: In this article, the authors used the Monte Carlo method to simulate electron transport in bulk, wurtzite phase AlN using a three-valley analytical band structure, where spherical, nonparabolic conduction band valleys at the Γ, K, and U symmetry points of the Brillouin zone were fitted to a first-principles band structure.
Abstract: The Monte Carlo method is used to simulate electron transport in bulk, wurtzite phase AlN using a three valley analytical band structure. Spherical, nonparabolic conduction band valleys at the Γ, K, and U symmetry points of the Brillouin zone are fitted to a first-principles band structure. The electron drift mobility is calculated as a function of temperature and ionized donor concentration in the ranges of 300–600 K and 1016–1018 cm−3, respectively. The effect of compensation on ionized impurity scattering and the associated change in the mobility are considered. The simulated electron steady-state drift velocity and valley occupancy for electric fields up to 600 kV/cm are presented for 300, 450, and 600 K. Our calculations predict that AlN will exhibit a much smaller negative differential mobility effect than GaN, and that the drift velocity versus electric field curve will show a very broad peak.

45 citations

Journal ArticleDOI
TL;DR: In this article, the authors present a general methodology, materials theory based modeling, for predicting device performance in technologically immature materials that can proceed relatively independently of experiment, using Monte Carlo and selfconsistent charge control modeling of GaN based devices.
Abstract: In this paper we present a general methodology, materials theory based modeling, for predicting device performance in technologically immature materials that can proceed relatively independently of experiment. The models incorporated within this general approach extend from a fundamental physics based, microscopic analysis to macroscopic, engineering based device models. Using this scheme, we have investigated the transport and breakdown properties of several emerging wide band gap semiconductor materials, i.e. GaN, InN, 3C-SiC, and 4H-SiC. The carrier drift velocities, mobilities, and impact ionization coefficients for these materials can be predicted using the materials theory based modeling method. Using these results, device level simulations can then be made. Here we report Monte Carlo and selfconsistent charge control modeling of GaN based devices. Comparison to experimental measurements is made when possible. Good agreement between the selfconsistent charge control model calculations and experiment is obtained. Some of the issues pertinent to heterostructure bipolar transistor modeling of GaN are discussed.

37 citations

Journal ArticleDOI
TL;DR: Dept. of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN, 55455; Dept. of Information Technology, Mid-Sweden University, S-851 70 Sundsvall, Sweden as mentioned in this paper.
Abstract: Dept. of Electrical Engineering, Boston University, Boston, MA. 02215. Movaz Networks, 5445 Triangle Parkway, Norcross, GA 30092 Dipartimento di Elettronica, Politecnico di Torino, corso Duca degli Abruzzi 24,110129 Torino, Italy Dept. of Information Technology, Mid-Sweden University, S-851 70 Sundsvall, Sweden. School of Electrical and Computer Engineering, Georgia Tech, Atlanta, GA, 303320250 Dept. of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN, 55455.

11 citations


Cited by
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Journal ArticleDOI
TL;DR: In this article, the splitting of the valence band by crystal field and spin-orbit interaction has been calculated and measured, and the measured values agree with the calculated values and the effects of strain on the splitting and optical properties have been studied in detail.
Abstract: During the last few years the developments in the field of III–nitrides have been spectacular. High quality epitaxial layers can now be grown by MOVPE. Recently good quality epilayers have also been grown by MBE. Considerable work has been done on dislocations, strain, and critical thickness of GaN grown on different substrates. Splitting of valence band by crystal field and by spin-orbit interaction has been calculated and measured. The measured values agree with the calculated values. Effects of strain on the splitting of the valence band and on the optical properties have been studied in detail. Values of band offsets at the heterointerface between several pairs of different nitrides have been determined. Extensive work has been done on the optical and electrical properties. Near band-edge spectra have been measured over a wide range of temperatures. Free and bound exciton peaks have been resolved. Valence band structure has been determined using the PL spectra and compared with the theoretically calcu...

1,202 citations

Journal ArticleDOI
TL;DR: In this paper, the authors compared the acceleration and velocity overshoot in wurtzite GaN, InN, and AlN compared with that which occurs in GaAs.
Abstract: Transient electron transport and velocity overshoot in wurtzite GaN, InN, and AlN are examined and compared with that which occurs in GaAs. For all materials, we find that electron velocity overshoot only occurs when the electric field is increased to a value above a certain critical field, unique to each material. This critical field is strongly dependent on the material, about 4 kV/cm for the case of GaAs but much higher for the III–nitride semiconductors: 140 kV/cm for GaN, 65 kV/cm for InN, and 450 kV/cm for AlN. We find that InN exhibits the highest peak overshoot velocity and that this velocity overshoot lasts over the longest distances when compared with GaN and AlN. Finally, using a one-dimensional energy–momentum balance approach, a simple model is used to estimate the cutoff frequency performance of nitride based heterojunction field effect transistors (HFETs) and a comparison is made to recently fabricated AlGaN/GaN HFETs.

526 citations

Journal ArticleDOI
TL;DR: In this paper, the development of fabrication processes for these devices and the current state-of-the-art in device performance, for all of these structures, are discussed. And the authors also detail areas where more work is needed, such as reducing defect densities and purity of epitaxial layers, the need for substrates and improved oxides and insulators, improved p-type doping and contacts and an understanding of the basic growth mechanisms.
Abstract: GaN and related materials (especially AlGaN) have recently attracted a lot of interest for applications in high power electronics capable of operation at elevated temperatures. Although the growth and processing technology for SiC, the other viable wide bandgap semiconductor material, is more mature, the AlGaInN system offers numerous advantages. These include wider bandgaps, good transport properties, the availability of heterostructures (particularly AlGaN/GaN), the experience base gained by the commercialization of GaN-based laser and light-emitting diodes and the existence of a high growth rate epitaxial method (hydride vapor phase epitaxy) for producing very thick layers or even quasi-substrates. These attributes have led to rapid progress in the realization of a broad range of GaN electronic devices, including heterostructure field effect transistors (HFETs), Schottky and p–i–n rectifiers, heterojunction bipolar transistors (HBTs), bipolar junction transistors (BJTs) and metal-oxide semiconductor field effect transistors (MOSFETs). This review focuses on the development of fabrication processes for these devices and the current state-of-the-art in device performance, for all of these structures. We also detail areas where more work is needed, such as reducing defect densities and purity of epitaxial layers, the need for substrates and improved oxides and insulators, improved p-type doping and contacts and an understanding of the basic growth mechanisms.

437 citations

Journal ArticleDOI
TL;DR: In this paper, a comprehensive study of the transport dynamics of electrons in the ternary compounds, Al/sub x/Ga/sub 1-x/N and In/sub ng/g/ng/s/n g/n/g n/g 1.x/n, is presented, which includes all of the major scattering mechanisms.
Abstract: We present a comprehensive study of the transport dynamics of electrons in the ternary compounds, Al/sub x/Ga/sub 1-x/N and In/sub x/Ga/sub 1-x/N. Calculations are made using a nonparabolic effective mass energy band model. Monte Carlo simulation that includes all of the major scattering mechanisms. The band parameters used in the simulation are extracted from optimized pseudopotential band calculations to ensure excellent agreement with experimental information and ab initio band models. The effects of alloy scattering on the electron transport physics are examined. The steady state velocity field curves and low field mobilities are calculated for representative compositions of these alloys at different temperatures and ionized impurity concentrations. A field dependent mobility model is provided for both ternary compounds AlGaN and InGaN. The parameters for the low and high field mobility models for these ternary compounds are extracted and presented. The mobility models can be employed in simulations of devices that incorporate the ternary III-nitrides.

421 citations

Journal ArticleDOI
TL;DR: In this article, vertical p-n diodes fabricated on pseudobulk low defect density GaN substrates are discussed, with drift layer thicknesses of 6 to 40 µm and net carrier electron concentrations of $4\times 10^{15}$ to $2.5 µm.
Abstract: There is a great interest in wide-bandgap semiconductor devices and most recently in monolithic GaN structures for power electronics applications. In this paper, vertical p-n diodes fabricated on pseudobulk low defect density ( $10^{4}$ – $10^{6}$ cm $^{-2}$ ) GaN substrates are discussed. Homoepitaxial low-pressure metal organic chemical vapor deposition growth of GaN on its native substrate and being able to control and balance the n-type Si doping with background C impurity has allowed the realization of vertical device architectures with drift layer thicknesses of 6 to 40 $\mu $ m and net carrier electron concentrations of $4\times 10^{15}$ to $2.5\times 10^{16}$ cm $^{-3}$ . This parameter range is suitable for applications requiring breakdown voltages (BVs) of 600 V–4 kV with a proper edge termination strategy. Measured devices demonstrate near power device figure of merit, that is, differential specific on-resistance ( $R_{{{\textrm {sp}}}}$ ) of 2 m $\Omega $ cm $^{2}$ for a BV of 2.6 kV and 2.95 m $\Omega $ cm $^{2}$ for a 3.7-kV device, respectively. The improvement in the substrate quality over the last few years has resulted in the fabrication of diodes with areas as large as 16 mm $^{2}$ , with BVs exceeding 700 V and pulsed (100 $\mu $ s) currents of 400 A. The structures fabricated are utilized to study in detail the temperature dependency of $I$ – $V$ characteristics, impact ionization and avalanche characteristics, and extract (estimate) modeling parameters such as electron mobility in the GaN $c$ -direction (vertical) and hole minority carrier lifetimes. Some insight into device reliability is also provided.

292 citations