M
Michael Clavel
Researcher at Virginia Tech
Publications - 48
Citations - 560
Michael Clavel is an academic researcher from Virginia Tech. The author has contributed to research in topics: Molecular beam epitaxy & Heterojunction. The author has an hindex of 12, co-authored 43 publications receiving 382 citations.
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Journal ArticleDOI
Lead-free epitaxial ferroelectric material integration on semiconducting (100) Nb-doped SrTiO3 for low-power non-volatile memory and efficient ultraviolet ray detection.
Souvik Kundu,Michael Clavel,Pranab Biswas,Bo Chen,Hyun Cheol Song,Prashant Kumar,Nripendra N. Halder,Mantu K. Hudait,Pallab Banerji,Mohan Sanghadasa,Shashank Priya +10 more
TL;DR: Combined this work paves the pathway towards designing future generation low-power ferroelectric based microelectronic devices by merging both electrical and photovoltaic properties of BT-BFO materials.
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Integration of lead-free ferroelectric on HfO2/Si (100) for high performance non-volatile memory applications
Souvik Kundu,Deepam Maurya,Michael Clavel,Yuan Zhou,Nripendra N. Halder,Mantu K. Hudait,Pallab Banerji,Shashank Priya +7 more
TL;DR: A novel lead-free ferroelectric thin film integrated on to HfO2 buffered Si for non-volatile memory (NVM) applications is introduced and a new possibility to embed the system within current complementary metal-oxide-semiconductor processing technology is opened up.
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Reduced erbium-doped ceria nanoparticles: one nano-host applicable for simultaneous optical down- and up-conversions.
Nader Shehata,Kathleen Meehan,Ibrahim Hassounah,Mantu K. Hudait,Nikhil Jain,Michael Clavel,Sarah El-Helw,N.K. Madi +7 more
TL;DR: The synthesized erbium-doped ceria nanoparticles can emit visible light when excited with either UV or IR photons and opens new opportunities for applications where emission of light via both up- and down-conversions from a single nanomaterial is desired such as solar cells and bio-imaging.
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Strain-Engineered Biaxial Tensile Epitaxial Germanium for High-Performance Ge/InGaAs Tunnel Field-Effect Transistors
TL;DR: The structural, morphological, and energy band alignment properties of biaxial tensile-strained germanium epilayers, grown in-situ on GaAs via a linearly graded InxGa1−xAs buffer architecture and utilizing dual chamber molecular beam epitaxy, were investigated in this article.
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Heterogeneous Integration of Epitaxial Ge on Si using AlAs/GaAs Buffer Architecture: Suitability for Low-power Fin Field-Effect Transistors
TL;DR: The heterogeneous integration of device-quality epitaxial Ge on Si using composite AlAs/GaAs large bandgap buffer, grown by molecular beam epitaxy that is suitable for fabricating low-power fin field-effect transistors required for continuing transistor miniaturization is reported on.