M
Michiharu Nakamura
Researcher at Hitachi
Publications - 70
Citations - 1855
Michiharu Nakamura is an academic researcher from Hitachi. The author has contributed to research in topics: Laser & Semiconductor. The author has an hindex of 19, co-authored 69 publications receiving 1849 citations.
Papers
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Journal ArticleDOI
Periodic structures for integrated optics
Amnon Yariv,Michiharu Nakamura +1 more
TL;DR: In this article, the theory and device applications of periodic thin-film waveguides are discussed, including mode solutions, optical filters, distributed feedback lasers, distributed Bragg reflector (DBR) lasers, grating couplers, and phase matching in nonlinear interactions.
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Transverse mode stabilized Al x Ga 1-x As injection lasers with channeled-substrate-planar structure
Kunio Aiki,Michiharu Nakamura,Takao Kuroda,Jun-Ichi Umeda,Ryoichi Ito,Naoki Chinone,M. Maeda +6 more
TL;DR: In this paper, a built-in passive waveguide mechanism is introduced in Al x Ga 1-x As injection lasers by growing planar double heterostructure (DH) layers on a grooved GaAs substrate.
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Longitudinal‐mode behaviors of mode‐stabilized AlxGa1−xAs injection lasers
TL;DR: In this paper, a transverse-mode-stabilized AlGaAs laser of a channeled-substrate planar structure was investigated, and the authors found that the intensity distribution and excitation dependence of a non-lasing longitudinal mode have been more complicated than expected from a simple theory.
Journal ArticleDOI
Channeled‐substrate planar structure (AlGa)As injection lasers
TL;DR: In this paper, a passive guiding mechanism is introduced by growing planar (AlGa)As/GaAs double-heterostructure (DH) layers on a grooved GaAs substrate.
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cw operation of distributed‐feedback GaAs‐GaAlAs diode lasers at temperatures up to 300 K
TL;DR: In this paper, a distributed feedback GaAs-GaAlAs diode laser with separate optical and carrier confinement has been successfully operated under dc bias up to room temperature, with a threshold current density of 0.94 kA/cm2 at 170 K and 3.5 kA 2.5 K at 300 K.