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Miguel Sanchez-Garcia

Bio: Miguel Sanchez-Garcia is an academic researcher from International Center for Agricultural Research in the Dry Areas. The author has contributed to research in topics: Molecular beam epitaxy & Photoluminescence. The author has an hindex of 32, co-authored 111 publications receiving 3615 citations. Previous affiliations of Miguel Sanchez-Garcia include ETSI & Polytechnic University of Puerto Rico.


Papers
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Journal ArticleDOI
TL;DR: Wurtzite GaN nanocolumns are reproducibly grown by plasma-assisted molecular beam epitaxy on Si(111) and c-sapphire substrates.
Abstract: Wurtzite GaN nanocolumns are reproducibly grown by plasma-assisted molecular beam epitaxy on Si(111) and c-sapphire substrates. The nanocolumns density and diameter (600\char21{}1500 \AA{}) are effectively controlled by means of the III/V ratio. The nanocolumns are fully relaxed from lattice and thermal strain, having a very good crystal quality characterized by strong and narrow (2 meV) low-temperature photoluminescence excitonic lines at 3.472\char21{}3.478 eV. In addition, the spectra reveal a doublet at 3.452\char21{}3.458 eV and a broad line centered at 3.41 eV. This broad emission shows a sample-dependent spectral energy dispersion, from 3.40 to 3.42 eV, explained as due to the effect of strain and/or electric fields associated with extended structural defects located at the nanocolumns bottom interface. From cathodoluminescence data, it is concluded that the doublet emission lines originate at the nanocolumns volume, most probably related to ${\mathrm{Ga}}_{\mathrm{I}}$ defects, given the column growth mode (Ga balling).

368 citations

Journal ArticleDOI
TL;DR: In this article, the effect of the III/V ratio and substrate temperature on the growth of GaN and A1N films on Si(1 1 1) substrates by molecular beam epitaxy, where active nitrogen was generated by a radio frequency plasma source.

313 citations

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TL;DR: In this article, a deep trap that captures photoelectrons from the valence band, after being emptied with photons above 2.5 eV, is proposed as the origin of these features.
Abstract: Photocapacitance spectra in undoped, metal-organic vapor-phase-epitaxy-grown GaN layers, in a range of photon energies from 0.6 to 3.5 eV, reveal two main persistent features: a broad increase of the capacitance from 2.0 to 2.5 eV, and a steep {ital decrease} at 1 eV, only observed after a previous light exposure to photon energies above 2.5 eV. A deep trap (E{sub v}+1 eV) that captures photoelectrons from the valence band, after being emptied with photons above 2.5 eV, is proposed as the origin of these features. Optical-current deep-level transient spectroscopy results also show the presence of a trap at 0.94 eV {ital above} the valence band, {ital only} detected after light excitation with photon energies above 2.5 eV. A correlation is found between the {open_quotes}yellow band{close_quotes} luminescence intensity at 2.2 eV and the amplitude of the photocapacitance decrease at 1 eV, pointing to a deep trap at 1 eV {ital above} the valence band as the recombination path for the yellow band. The detection of the yellow band with below-the-gap photoluminescence excitation supports the proposed model. {copyright} {ital 1997} {ital The American Physical Society}

191 citations

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TL;DR: In this article, a combination of optimized AIN buffer layers and a two-step growth process leads to GaN layers of high crystal quality (8 arcmin X-ray diffraction full-width at half-maximum) and flat surfaces (57 A rms).

183 citations

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Abstract: GaN photoconductive detectors have been fabricated on sapphire substrates by metal organic vapor phase epitaxy and gas-source molecular beam epitaxy on Si (111) substrates. The photodetectors showed high photoconductor gains, a very nonlinear response with illuminating power, and an intrinsic nonexponential photoconductance recovery process. A novel photoconductor gain mechanism is proposed to explain such results, based on a modulation of the conductive volume of the layer.

168 citations


Cited by
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Journal ArticleDOI
TL;DR: In this paper, the authors describe the state-of-the-art computational methodology for calculating the structure and energetics of point defects and impurities in semiconductors and pay particular attention to computational aspects which are unique to defects or impurities, such as how to deal with charge states and how to describe and interpret transition levels.
Abstract: First-principles calculations have evolved from mere aids in explaining and supporting experiments to powerful tools for predicting new materials and their properties. In the first part of this review we describe the state-of-the-art computational methodology for calculating the structure and energetics of point defects and impurities in semiconductors. We will pay particular attention to computational aspects which are unique to defects or impurities, such as how to deal with charge states and how to describe and interpret transition levels. In the second part of the review we will illustrate these capabilities with examples for defects and impurities in nitride semiconductors. Point defects have traditionally been considered to play a major role in wide-band-gap semiconductors, and first-principles calculations have been particularly helpful in elucidating the issues. Specifically, calculations have shown that the unintentional n-type conductivity that has often been observed in as-grown GaN cannot be a...

2,557 citations

Journal ArticleDOI
TL;DR: In this paper, a comprehensive and up-to-date compilation of band parameters for all of the nitrogen-containing III-V semiconductors that have been investigated to date is presented.
Abstract: We present a comprehensive and up-to-date compilation of band parameters for all of the nitrogen-containing III–V semiconductors that have been investigated to date. The two main classes are: (1) “conventional” nitrides (wurtzite and zinc-blende GaN, InN, and AlN, along with their alloys) and (2) “dilute” nitrides (zinc-blende ternaries and quaternaries in which a relatively small fraction of N is added to a host III–V material, e.g., GaAsN and GaInAsN). As in our more general review of III–V semiconductor band parameters [I. Vurgaftman et al., J. Appl. Phys. 89, 5815 (2001)], complete and consistent parameter sets are recommended on the basis of a thorough and critical review of the existing literature. We tabulate the direct and indirect energy gaps, spin-orbit and crystal-field splittings, alloy bowing parameters, electron and hole effective masses, deformation potentials, elastic constants, piezoelectric and spontaneous polarization coefficients, as well as heterostructure band offsets. Temperature an...

2,525 citations

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TL;DR: In this paper, the structural and point defects caused by lattice and stacking mismatch with substrates are discussed. But even the best of the three binaries, InN, AIN and AIN as well as their ternary compounds, contain many structural defects, and these defects notably affect the electrical and optical properties of the host material.
Abstract: Gallium nitride (GaN) and its allied binaries InN and AIN as well as their ternary compounds have gained an unprecedented attention due to their wide-ranging applications encompassing green, blue, violet, and ultraviolet (UV) emitters and detectors (in photon ranges inaccessible by other semiconductors) and high-power amplifiers. However, even the best of the three binaries, GaN, contains many structural and point defects caused to a large extent by lattice and stacking mismatch with substrates. These defects notably affect the electrical and optical properties of the host material and can seriously degrade the performance and reliability of devices made based on these nitride semiconductors. Even though GaN broke the long-standing paradigm that high density of dislocations precludes acceptable device performance, point defects have taken the center stage as they exacerbate efforts to increase the efficiency of emitters, increase laser operation lifetime, and lead to anomalies in electronic devices. The p...

1,724 citations

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TL;DR: The role of extended and point defects, and key impurities such as C, O, and H, on the electrical and optical properties of GaN is reviewed in this article, along with the influence of process-induced or grown-in defects and impurities on the device physics.
Abstract: The role of extended and point defects, and key impurities such as C, O, and H, on the electrical and optical properties of GaN is reviewed. Recent progress in the development of high reliability contacts, thermal processing, dry and wet etching techniques, implantation doping and isolation, and gate insulator technology is detailed. Finally, the performance of GaN-based electronic and photonic devices such as field effect transistors, UV detectors, laser diodes, and light-emitting diodes is covered, along with the influence of process-induced or grown-in defects and impurities on the device physics.

1,693 citations