Minghwei Hong

Bio: Minghwei Hong is an academic researcher from National Taiwan University. The author has contributed to research in topics: Molecular beam epitaxy & Epitaxy. The author has an hindex of 58, co-authored 515 publications receiving 14309 citations. Previous affiliations of Minghwei Hong include Agere Systems & AT&T.

Epitaxial cubic gadolinium oxide as a dielectric for gallium arsenide passivation

Abstract: Epitaxial growth of single-crystal gadolinium oxide dielectric thin films on gallium arsenide is reported. The gadolinium oxide film has a cubic structure isomorphic to manganese oxide and is (110)-oriented in single domain on the (100) gallium arsenide surface. The gadolinium oxide film has a dielectric constant of approximately 10, with low leakage current densities of about 10(-9) to 10(-10) amperes per square centimeter at zero bias. Typical breakdown field is 4 megavolts per centimeter for an oxide film 185 angstroms thick and 10 megavolts per centimeter for an oxide 45 angstroms thick. Both accumulation and inversion layers were observed in the gadolinium oxide-gallium arsenide metal oxide semiconductor diodes, using capacitance-voltage measurements. The ability to grow thin single-crystal oxide films on gallium arsenide with a low interfacial density of states has great potential impact on the electronic industry of compound semiconductors.

Ga2O3 films for electronic and optoelectronic applications

Abstract: Properties of Ga2O3 thin films deposited by electron‐beam evaporation from a high‐purity single‐crystal Gd3Ga5O12 source are reported. As‐deposited Ga2O3 films are amorphous, stoichiometric, and homogeneous. Excellent uniformity in thickness and refractive index was obtained over a 2 in. wafer. The films maintain their integrity during annealing up to 800 and 1200 °C on GaAs and Si substrates, respectively. Optical properties including refractive index (n=1.84–1.88 at 980 nm wavelength) and band gap (4.4 eV) are close or identical, respectively, to Ga2O3 bulk properties. Reflectivities as low as 10−5 for Ga2O3/GaAs structures and a small absorption coefficient (≊100 cm−1 at 980 nm) were measured. Dielectric properties include a static dielectric constant between 9.9 and 10.2, which is identical to bulk Ga2O3, and electric breakdown fields up to 3.6 MV/cm. The Ga2O3/GaAs interface demonstrated a significantly higher photoluminescence intensity and thus a lower surface recombination velocity as compared to ...

Surface passivation of III-V compound semiconductors using atomic-layer-deposition-grown Al2O3

Abstract: Al2O3 was deposited on In0.15Ga0.85As∕GaAs using atomic-layer deposition (ALD). Without any surface preparation or postthermal treatment, excellent electrical properties of Al2O3∕InGaAs∕GaAs heterostructures were obtained, in terms of low electrical leakage current density (10−8 to 10−9A∕cm2) and low interfacial density of states (Dit) in the range of 1012cm−2eV−1. The interfacial reaction and structural properties studied by high-resolution x-ray photoelectron spectroscopy (HRXPS) and high-resolution transmission electron microscopy (HRTEM). The depth profile of HRXPS, using synchrotron radiation beam and low-energy Ar+ sputtering, exhibited no residual arsenic oxides at interface. The removal of the arsenic oxides from Al2O3∕InGaAs heterostructures during the ALD process ensures the Fermi-level unpinning, which was observed in the capacitance-voltage measurements. The HRTEM shows sharp transition from amorphous oxide to single crystalline semiconductor.

Crystal structure of the 80 K superconductor YBa2Cu4O8

Abstract: Recently a new Y–Ba–Cu–O superconducting oxide has been prepared as a distinct phase in thin films1–3. The new phase was first seen as a defect structure in bulk samples of YBa2Cu3O7 (refs 4–7) and found to contain an additional copper layer7. The proposed defect structure has a c-axis spacing of ∼27 A and a cation ratio of YBa2Cu4. Y–Ba–Cu–O films containing a majority phase with a 27 A unit cell have been proposed as evidence of a distinct phase with the same structure as the defects (ref. 1 and K. Char et al., unpublished results). Films of the new phase superconduct with a transition temperature of 80 K (K. Char et al., unpublished results and refs 2 and 3). We show by X-ray crystallography of a film containing 85% of the new phase that the stoichiometry can be written as YBa2Cu4O8. The new structure differs from YBa2Cu3O7 in that the single, linear Cu–O chain parallel to the b-axis has been replaced by a double Cu–O chain with edge-sharing, square-planar oxygen coordination.

Properties of high κ gate dielectrics Gd2O3 and Y2O3 for Si

Abstract: We present the materials growth and properties of both epitaxial and amorphous films of Gd2O3 (κ=14) and Y2O3 (κ=18) as the alternative gate dielectrics for Si. The rare earth oxide films were prepared by ultrahigh vacuum vapor deposition from an oxide source. The use of vicinal Si (100) substrates is key to the growth of (110) oriented, single domain films in the Mn2O3 structure. Compared to SiO2 gate oxide, the crystalline Gd2O3 and Y2O3 oxide films show a reduction of electrical leakage at 1 V by four orders of magnitude over an equivalent oxide thickness range of 10–20 A. The leakage of amorphous Y2O3 films is about six orders of magnitude better than SiO2 due to a smooth morphology and abrupt interface with Si. The absence of SiO2 segregation at the dielectric/Si interface is established from infrared absorption spectroscopy and scanning transmission electron microscopy. The amorphous Gd2O3 and Y2O3 films withstand the high temperature anneals to 850 °C and remain electrically and chemically intact.

Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

Abstract: Transparent electronic devices formed on flexible substrates are expected to meet emerging technological demands where silicon-based electronics cannot provide a solution. Examples of active flexible applications include paper displays and wearable computers1. So far, mainly flexible devices based on hydrogenated amorphous silicon (a-Si:H)2,3,4,5 and organic semiconductors2,6,7,8,9,10 have been investigated. However, the performance of these devices has been insufficient for use as transistors in practical computers and current-driven organic light-emitting diode displays. Fabricating high-performance devices is challenging, owing to a trade-off between processing temperature and device performance. Here, we propose to solve this problem by using a novel semiconducting material—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs). The a-IGZO is deposited on polyethylene terephthalate at room temperature and exhibits Hall effect mobilities exceeding 10 cm2 V-1 s-1, which is an order of magnitude larger than for hydrogenated amorphous silicon. TTFTs fabricated on polyethylene terephthalate sheets exhibit saturation mobilities of 6–9 cm2 V-1 s-1, and device characteristics are stable during repetitive bending of the TTFT sheet.

High-κ gate dielectrics: Current status and materials properties considerations

Abstract: Many materials systems are currently under consideration as potential replacements for SiO2 as the gate dielectric material for sub-0.1 μm complementary metal–oxide–semiconductor (CMOS) technology. A systematic consideration of the required properties of gate dielectrics indicates that the key guidelines for selecting an alternative gate dielectric are (a) permittivity, band gap, and band alignment to silicon, (b) thermodynamic stability, (c) film morphology, (d) interface quality, (e) compatibility with the current or expected materials to be used in processing for CMOS devices, (f) process compatibility, and (g) reliability. Many dielectrics appear favorable in some of these areas, but very few materials are promising with respect to all of these guidelines. A review of current work and literature in the area of alternate gate dielectrics is given. Based on reported results and fundamental considerations, the pseudobinary materials systems offer large flexibility and show the most promise toward success...

Quantum cascade laser

Abstract: The invention concerns a quantum cascade laser comprising in particular a gain region (14) consisting of several layers (20) each including: alternating strata of a first type (28) defining each an AllnAs quantum barrier and strata of a second type (28) defining each an InGaAs quantum barrier, and injection barriers (22), interposed between two of the layers (20). The layers of the gain region (14) form each an active zone extending from one to the other of the injection barriers (22) adjacent thereto. The strata (26, 28) are dimensioned such that: each of the wells comprises, in the presence of an electric field, at least a first upper subband, a second median subband, and a third lower subband, and the probability of an electron being present in the first subband is highest in the proximity of one of the adjacent injection barriers, in the second subband in the median part of the zone and in the third subband in the proximity of the other adjacent barriers. The laser is formed by a succession of active zones and injection barriers, without interposition of a relaxation zone.

Magnetic control of ferroelectric polarization

Abstract: The magnetoelectric effect--the induction of magnetization by means of an electric field and induction of polarization by means of a magnetic field--was first presumed to exist by Pierre Curie, and subsequently attracted a great deal of interest in the 1960s and 1970s (refs 2-4). More recently, related studies on magnetic ferroelectrics have signalled a revival of interest in this phenomenon. From a technological point of view, the mutual control of electric and magnetic properties is an attractive possibility, but the number of candidate materials is limited and the effects are typically too small to be useful in applications. Here we report the discovery of ferroelectricity in a perovskite manganite, TbMnO3, where the effect of spin frustration causes sinusoidal antiferromagnetic ordering. The modulated magnetic structure is accompanied by a magnetoelastically induced lattice modulation, and with the emergence of a spontaneous polarization. In the magnetic ferroelectric TbMnO3, we found gigantic magnetoelectric and magnetocapacitance effects, which can be attributed to switching of the electric polarization induced by magnetic fields. Frustrated spin systems therefore provide a new area to search for magnetoelectric media.