N. S. Viswanathan

Bio: N. S. Viswanathan is an academic researcher from IBM. The author has contributed to research in topics: Photolithography & Lithography. The author has an hindex of 2, co-authored 2 publications receiving 1359 citations.

Improving resolution in photolithography with a phase-shifting mask

Abstract: The phase-shifting mask consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite. Destructive interference between waves from adjacent apertures cancels some diffraction effects and increases the spatial resolution with which such patterns can be projected. A simple theory predicts a near doubling of resolution for illumination with partial incoherence σ < 0.3, and substantial improvements in resolution for σ < 0.7. Initial results obtained with a phase-shifting mask patterned with typical device structures by electron-beam lithography and exposed using a Mann 4800 10× tool reveals a 40-percent increase in usuable resolution with some structures printed at a resolution of 1000 lines/mm. Phase-shifting mask structures can be used to facilitate proximity printing with larger gaps between mask and wafer. Theory indicates that the increase in resolution is accompanied by a minimal decrease in depth of focus. Thus the phase-shifting mask may be the most desirable device for enhancing optical lithography resolution in the VLSI/VHSIC era.

Improving resolution in photolithography with a phase-shifting mask

Abstract: The phase-shifting mask consists of a normal transmission mask that has been coated with a transparent layer patterned to ensure that the optical phases of nearest apertures are opposite. Destructive interference between waves from adjacent apertures cancels some diffraction effects and increases the spatial resolution with which such patterns can be projected. A simple theory predicts a near doubling of resolution for illumination with partial incoherence σ < 0.3, and substantial improvements in resolution for σ < 0.7. Initial results obtained with a phase-shifting mask patterned with typical device structures by electron-beam lithography and exposed using a Mann 4800 10X tool reveals a 40-percent increase in usuable resolution with some structures printed at a resolution of 1000 lines/mm. Phase-shifting mask structures can be used to facilitate proximity printing with larger gaps between mask and wafer. Theory indicates that the increase in resolution is accompanied by a minimal decrease in depth of focus. Thus the phase-shifting mask may be the most desirable device for enhancing optical lithography resolution in the VLSI/VHSIC era.

Pushing the limits of lithography

Abstract: The phenomenal rate of increase in the integration density of silicon chips has been sustained in large part by advances in optical lithography--the process that patterns and guides the fabrication of the component semiconductor devices and circuitry. Although the introduction of shorter-wavelength light sources and resolution-enhancement techniques should help maintain the current rate of device miniaturization for several more years, a point will be reached where optical lithography can no longer attain the required feature sizes. Several alternative lithographic techniques under development have the capability to overcome these resolution limits but, at present, no obvious successor to optical lithography has emerged.

Novel cold cathode materials and applications

Abstract: Field emission (FE) is based on the physical phenomenon of quantum tunneling, in which electrons are injected from the surface of materials into vacuum under the influence of an applied electric field. A variety of field emission cold cathode materials have been developed to date. In this review, we shall focus on several kinds of novel cold cathode materials that have been developed in the past decade. These include materials for microfabricated field-emitter arrays, diamond and related films, carbon nanotubes, other quasi one-dimensional nanomaterials and printable composite materials. In addition, cold cathode materials have a wide range of applications such as in flat panel displays, high-power vacuum electronic devices, microwave-generation devices, vacuum microelectronic devices and vacuum nanoelectronic devices. Applications are in consumer goods, military industries and also space technology. A comprehensive overview of the various applications is presented. Recently, recognizing the strong possibility that vacuum nanoelectronic devices using quasi one-dimensional nanomaterials, such as carbon nanotubes may emit electrons with driving voltages comparable to that of a solid-state device, there is a growing interest in novel applications of such devices. With such exciting opportunities, there is now a flurry of activities to explore applications far beyond those considered for the conventional hot cathodes that operate on thermionic emission. We shall discuss the details of a number of fascinating potential applications.

Principles of Lithography

Abstract: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Lithography and Other Patterning Techniques for Future Electronics

Abstract: For all technologies, from flint arrowheads to DNA microarrays, patterning the functional material is crucial. For semiconductor integrated circuits (ICs), it is even more critical than for most technologies because enormous benefits accrue to going smaller, notably higher speed and much less energy consumed per computing function. The consensus is that ICs will continue to be manufactured until at least the ldquo22 nm noderdquo (the linewidth of an equal line-space pattern). Most patterning of ICs takes place on the wafer in two steps: (a) lithography, the patterning of a resist film on top of the functional material; and (b) transferring the resist pattern into the functional material, usually by etching. Here we concentrate on lithography. Optics has continued to be the chosen lithographic route despite its continually forecast demise. A combination of 193-nm radiation, immersion optics, and computer-intensive resolution enhancement technology will probably be used for the 45- and 32-nm nodes. Optical lithography usually requires that we first make a mask and then project the mask pattern onto a resist-coated wafer. Making a qualified mask, although originally dismissed as a ldquosupport technology,rdquo now represents a significant fraction of the total cost of patterning an IC largely because of the measures needed to push resolution so far beyond the normal limit of optical resolution. Thus, although optics has demonstrated features well below 22 nm, it is not clear that optics will be the most economical in this range; nanometer-scale mechanical printing is a strong contender, extreme ultraviolet is still the official front runner, and electron beam lithography, which has demonstrated minimum features less than 10 nm wide, continues to be developed both for mask making and for directly writing on the wafer (also known as ldquomaskless lithographyrdquo). Going from laboratory demonstration to manufacturing technology is enormously expensive ( $1 billion) and for good reason. Just in terms of data rate (mask pattern to resist pattern), today's exposure tools achieve about 10 Tb/s at an allowable error rate of about 1/h; this data rate will double with each generation. In addition, the edge placement precision required will soon be 30 parts per billion. There are so many opportunities for unacceptable performance that making the right decision goes far beyond understanding the underlying physical principles. But the benefits of continuing to be able to manufacture electronics at the 22-nm node and beyond appear to justify the investment, and there is no shortage of ideas on how to accomplish this.

Phase shifting circuit manufacture method and apparatus

Abstract: A method and apparatus for creating a phase shifting mask and a structure mask for shrinking integrated circuit designs. One embodiment of the invention includes using a two mask process. The first mask is a phase shift mask and the second mask is a single phase structure mask. The phase shift mask primarily defines regions requiring phase shifting. The single phase structure mask primarily defines regions not requiring phase shifting. The single phase structure mask also prevents the erasure of the phase shifting regions and prevents the creation of undesirable artifact regions that would otherwise be created by the phase shift mask. Both masks are derived from a set of masks used in a larger minimum dimension process technology.