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N. T. Tran

Bio: N. T. Tran is an academic researcher. The author has contributed to research in topics: Thin film & Amorphous silicon. The author has an hindex of 1, co-authored 1 publications receiving 1 citations.

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Book ChapterDOI
01 Jan 1997
TL;DR: In this article, the transformation of low-cost a-SiC:H films towards materials with applications in microelectronics (polysilicon, silicon carbide, nitride, oxinitride) is discussed.
Abstract: Low cost a-SiC:H films are easily available on different substrates by Plasma Enhanced CVD. The aim of this work is the transformation of these films towards materials with applications in microelectronics (polysilicon, silicon carbide, nitride, oxinitride). Laser, plasma irradiation and thermal treatments in controlled atmosphere are possible candidates to modify the chemical composition and/or the structure of the a-SiC:H films.