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Nathan S. Lewis

Researcher at California Institute of Technology

Publications -  730
Citations -  72550

Nathan S. Lewis is an academic researcher from California Institute of Technology. The author has contributed to research in topics: Semiconductor & Silicon. The author has an hindex of 112, co-authored 720 publications receiving 64808 citations. Previous affiliations of Nathan S. Lewis include Lawrence Berkeley National Laboratory & Massachusetts Institute of Technology.

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Photoanodic behavior of vapor-liquid-solid–grown, lightly doped, crystalline Si microwire arrays

TL;DR: In this article, the Cu-catalyzed Si microwire array photoanodes exhibited open-circuit voltages of ∼0.44 V, carrier collection efficiencies exceeding ∼ 0.75, and an energy-conversion efficiency of 1.4% under simulated air mass 1.5 G illumination.
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Chlorination−Methylation of the Hydrogen-Terminated Silicon(111) Surface Can Induce a Stacking Fault in the Presence of Etch Pits

TL;DR: The experimental result of 23 degrees is surprising because it suggests a tendency of the methyl group toward the eclipsed configuration rather than staggered, and extensive fully periodic quantum mechanical Density Functional Theory studies of this surface give an equilibrium torsion angle of 37.5 degrees, indicating a tendency toward the staggered configuration.
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Effect of the Presence of Iodide on the Electron Injection Dynamics of Dye-Sensitized TiO2-Based Solar Cells

TL;DR: In this paper, the electron injection dynamics of dye-sensitized TiO-2-based solar cells have been investigated to determine the effects of replacing the I_3−/I^− redox system by non-redox-active supporting electrolytes.
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Enhanced Absorption and <1% Spectrum-and-Angle-Averaged Reflection in Tapered Microwire Arrays

TL;DR: In this article, the authors reported ordered, high aspect ratio, tapered Si microwire arrays that exhibit an extremely low angular (0° to 50°) and spectrally averaged reflectivity of < 1% of the incident 400-1100 nm illumination.
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High‐temperature annealing of implanted buried oxide in silicon

TL;DR: In this article, a silicon-on-insulator structure was formed by implanting 2×1018 oxygen ions cm−2 into crystalline silicon at 150 keV, and the effect of annealing temperature on the microstructure and oxygen concentration profile was investigated by using cross-sectional transmission-electron microscopy and Auger analysis.