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Oliver Ambacher

Researcher at Fraunhofer Society

Publications -  862
Citations -  29006

Oliver Ambacher is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Amplifier & Monolithic microwave integrated circuit. The author has an hindex of 64, co-authored 848 publications receiving 26256 citations. Previous affiliations of Oliver Ambacher include Osram & Siemens.

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Proceedings ArticleDOI

Comparison of two W-band low-noise amplifier MMICs with ultra low power consumption based on 50nm InGaAs mHEMT technology

TL;DR: In this paper, two millimeter-wave monolithic integrated circuit (MMIC) low-noise amplifiers (LNA), operating in the frequency range between 58 and 110 GHz and 74 and 110GHz, respectively, are presented.
Proceedings ArticleDOI

A highly linear 84 GHz low noise amplifier MMIC in AlGaN/GaN HEMT technology

TL;DR: In this article, a low-noise MMIC was implemented in a new AlGaN/GaN on s.i.c. SiC HEMT technology with 100 nm gate length and maximum cutoff frequencies of 80 and >200 GHz.
Journal ArticleDOI

Full W-Band GaN Power Amplifier MMICs Using a Novel Type of Broadband Radial Stub

TL;DR: In this article, the first reported full W-band (75-110 GHz) power amplifier (PA) monolithic microwave integrated circuits (MMICs) based on gallium nitride technology were described.
Journal ArticleDOI

Enhanced mechanical performance of AlN/nanodiamond micro-resonators

TL;DR: In this article, single and doubly clamped unimorph NCD-on-AlN micro-resonators were fabricated and then characterized by laser vibrometry towards their flexural resonant frequencies in the range of 0.1-20 MHz to deduce their mechanical properties.
Journal ArticleDOI

Threading dislocation propagation in AlGaN/GaN based HEMT structures grown on Si (111) by plasma assisted molecular beam epitaxy

TL;DR: In this article, a transmission electron microscopy (TEM) study was carried out on a series of AlGaN/GaN high-electron mobility transistor (HEMT) structures grown by plasma assisted molecular beam epitaxy (PA-MBE) on Si (111).