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Olivier Jardel

Researcher at Alcatel-Lucent

Publications -  57
Citations -  1107

Olivier Jardel is an academic researcher from Alcatel-Lucent. The author has contributed to research in topics: High-electron-mobility transistor & Amplifier. The author has an hindex of 16, co-authored 56 publications receiving 1015 citations. Previous affiliations of Olivier Jardel include University of Limoges & Alenia Aeronautica.

Papers
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Journal ArticleDOI

An Electrothermal Model for AlGaN/GaN Power HEMTs Including Trapping Effects to Improve Large-Signal Simulation Results on High VSWR

TL;DR: In this paper, a large-signal electrothermal model for AlGaN/GaN HEMTs including gate and drain related trapping effects is proposed, which is well formulated to preserve convergence capabilities and simulation times.
Journal ArticleDOI

AlInN/AlN/GaN HEMT Technology on SiC With 10-W/mm and 50% PAE at 10 GHz

TL;DR: In this paper, high-frequency high-electron-mobility transistors (HEMTs) were fabricated on AlInN/AlN/GaN heterostructures grown by low-pressure metal-organic chemical vapor deposition on a SiC substrate.
Proceedings ArticleDOI

A Drain-Lag Model for AlGaN/GaN Power HEMTs

TL;DR: In this article, drain-lag effects have been added in a non-linear electrothermal model for AlGaN/GaN HEMTs, which allows a better description of the I-V characteristics of measured devices as well as their large signal characteristics.
Proceedings ArticleDOI

State of the Art 58W, 38% PAE X-Band AlGaN/GaN HEMTs Microstrip MMIC Amplifiers

TL;DR: In this article, the results obtained on X-Band GaN MMICs developed in the frame of the Kerrigan project launched by the European Defense Agency were presented, achieving 58 W of output power with 38% PAE in X-band were obtained using an 18 mm 2 2 2-stages amplifier.
Journal ArticleDOI

ICP-CVD SiN Passivation for High-Power RF InAlGaN/GaN/SiC HEMT

TL;DR: In this paper, high-frequency metal insulator Semiconductor High-Electron-Mobility Transistors (MIS HEMTs) were fabricated on quaternary InAlGaN/AlN/GaN heterostructures, grown by MOCVD on a 3" SiC substrate.