Many materials systems are currently under consideration as potential replacements for SiO2 as the gate dielectric material for sub-0.1 μm complementary metal–oxide–semiconductor (CMOS) technology. A systematic consideration of the required properties of gate dielectrics indicates that the key guidelines for selecting an alternative gate dielectric are (a) permittivity, band gap, and band alignment to silicon, (b) thermodynamic stability, (c) film morphology, (d) interface quality, (e) compatibility with the current or expected materials to be used in processing for CMOS devices, (f) process compatibility, and (g) reliability. Many dielectrics appear favorable in some of these areas, but very few materials are promising with respect to all of these guidelines. A review of current work and literature in the area of alternate gate dielectrics is given. Based on reported results and fundamental considerations, the pseudobinary materials systems offer large flexibility and show the most promise toward success...

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High-κ gate dielectrics: Current status and materials properties considerations

Organic thin-film transistors (OTFTs) have lived to see great improvements in recent years. This review presents new insight into conduction mechanisms and performance characteristics, as well as opportunities for modeling properties of OTFTs. The shifted focus in research from novel chemical structures to fabrication technologies that optimize morphology and structural order is underscored by chapters on vacuum-deposited and solution-processed organic semiconducting films. Finally, progress in the growing field of the n-type OTFTs is discussed in ample detail. The Figure, showing a pentacene film edge on SiO2, illustrates the morphology issue.

Organic Thin Film Transistors for Large Area Electronics

A negative isotropic magnetoresistance effect more than three orders of magnitude larger than the typical giant magnetoresistance of some superlattice films has been observed in thin oxide films of perovskite-like La0.67Ca0.33MnOx. Epitaxial films that are grown on LaAIO3 substrates by laser ablation and suitably heat treated exhibit magnetoresistance values as high as 127,000 percent near 77 kelvin and ∼1300 percent near room temperature. Such a phenomenon could be useful for various magnetic and electric device applications if the observed effects of material processing are optimized. Possible mechanisms for the observed effect are discussed.

http://science.sciencemag.org/content/sci/264/5157/413.full.pdf

Thousandfold Change in Resistivity in Magnetoresistive La-Ca-Mn-O Films

2.2. Materials 929 2.3. Factors Influencing Charge Mobility 931 2.3.1. Molecular Packing 931 2.3.2. Disorder 932 2.3.3. Temperature 933 2.3.4. Electric Field 934 2.3.5. Impurities 934 2.3.6. Pressure 934 2.3.7. Charge-Carrier Density 934 2.3.8. Size/molecular Weight 935 3. The Charge-Transport Parameters 935 3.1. Electronic Coupling 936 3.1.1. The Energy-Splitting-in-Dimer Method 936 3.1.2. The Orthogonality Issue 937 3.1.3. Impact of the Site Energy 937 3.1.4. Electronic Coupling in Oligoacene Derivatives 938

Charge transport in organic semiconductors.

Since the discovery of highly conducting polyacetylene by Shirakawa, MacDiarmid, and Heeger in 1977, π-conjugated systems have attracted much attention as futuristic materials for the development and production of the next generation of electronics, that is, organic electronics. Conceptually, organic electronics are quite different from conventional inorganic solid state electronics because the structural versatility of organic semiconductors allows for the incorporation of functionality by molecular design. This versatility leads to a new era in the design of electronic devices. To date, the great number of π-conjugated semiconducting materials that have either been discovered or synthesized generate an exciting library of π-conjugated systems for use in organic electronics. 11 However, some key challenges for further advancement remain: the low mobility and stability of organic semiconductors, the lack of knowledge regarding structure property relationships for understanding the fundamental chemical aspects behind the structural design, and realization of desired properties. Organic field-effect transistors (OFETs) are a kind of device consisting of an organic semiconducting layer, a gate insulator layer, and three terminals (drain, source, and gate electrodes). OFETs are not only essential building blocks for the next generation of cheap and flexible organic circuits, but they also provide an important insight into the charge transport of πconjugated systems. Therefore, they act as strong tools for the exploration of the structure property relationships of πconjugated systems, such as parameters of field-effect mobility (μ, the drift velocity of carriers under unit electric field), current on/off ratio (the ratio of the maximum on-state current to the minimum off-state current), and threshold voltage (the minimum gate voltage that is required to turn on the transistor). 17 Since the discovery of OFETs in the 1980s, they have attracted much attention. Research onOFETs includes the discovery, design, and synthesis of π-conjugated systems for OFETs, device optimization, development of applications in radio frequency identification (RFID) tags, flexible displays, electronic papers, sensors, and so forth. It is beyond the scope of this review to cover all aspects of π-conjugated systems; hence, our focus will be on the performance analysis of π-conjugated systems in OFETs. This should make it possible to extract information regarding the fundamental merit of semiconducting π-conjugated materials and capture what is needed for newmaterials and what is the synthesis orientation of newπ-conjugated systems. In fact, for a new science with many practical applications, the field of organic electronics is progressing extremely rapidly. For example, using “organic field effect transistor” or “organic field effect transistors” as the query keywords to search the Web of Science citation database, it is possible to show the distribution of papers over recent years as shown in Figure 1A. It is very clear

Semiconducting π-conjugated systems in field-effect transistors: a material odyssey of organic electronics.

N‐channel field effect transistors with excellent device characteristics have been fabricated by utilizing C60 as the active element. Measurements on C60 thin films in ultrahigh vacuum show on‐off ratios as high as 106 and field effect mobilities up to 0.08 cm2/V s.

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C60 thin film transistors

Epitaxial ferroelectric SrRuO3/Pb(Zr0.52Ti0.48)O3/SrRuO3 heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO3 and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90° off‐axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X‐ray diffraction, Rutherford backscattering spectroscopy, and cross‐sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 1010 cycles, with a large remnant polarization.

Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO3) isotropic metallic oxide electrodes

The continuing drive towards miniaturization of electronic devices1 is motivating the search for new materials. Consider, for example, the case of the much-used dynamic random-access memory. The minimum capacitance per cell that can be tolerated is expected2 to remain at 30–40 fF, but as the cell area decreases, the corresponding reduction in geometric capacitance has to be compensated for. So far, this has been achieved by resorting to complex non-planar structures and/or using much thinner films of the dielectric insulator, amorphous silicon dioxide (a-SiOx), although the latter approach is limited by the electric fields that can be supported by a-SiOx before its insulating properties break down. An alternative strategy is to develop thin-film insulators that have a dielectric constant significantly greater than that of a-SiOx, reducing the size of the fields required for device operation. Here we show that a composition-spread technique allows for the efficient evaluating of materials with both a high dielectric constant and a high breakdown field. We apply this approach to the Zr–Sn–Ti–O system, and we find that compositions close to Zr0.15Sn0.3Ti0.55O2−δ are better thin-film dielectrics than high-quality deposited a-SiOx. Although detailed tests of the performance of these materials have not yet been carried out, our initial results suggest that they are likely to be comparable to the best alternatives (such as (Ba, Sr)TiO3) currently being considered for integrated-circuit capacitors.

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Discovery of a useful thin-film dielectric using a composition-spread approach

Colossal magnetoresistance with more than a thousandfold change in resistivity (ΔR/RH=127 000% at 77 K, H=6 T) has been obtained in epitaxially grown La‐Ca‐Mn‐O thin films. This magnetoresistance value is about three orders of magnitude higher than is typically seen in the giant‐magnetoresistance‐type metallic, superlattice films. The temperature of peak magnetoresistance is located in the region of metallic resistivity behavior. As the magnetoresistance peak occurs not at the temperature of magnetic transition but at a temperature where the magnetization is still substantial, the spin‐disorder scattering is not likely to be the main mechanism in these highly magnetoresistive films. The peak can be shifted to near room temperature by adjusting processing parameters. Near‐room‐temperature ΔR/RH values of ∼1300% at 260 K and ∼400% at 280 K have been observed. The presence of grain boundaries appears to be very detrimental to achieving large magnetoresistance in the lanthanum manganite compounds. The fact th...

Very large magnetoresistance in perovskite‐like La‐Ca‐Mn‐O thin films

Thermal sublimation of pure C60 and C70 has been used for depositing well‐characterized fullerene films on a variety of substrates. Film purity is determined by infrared absorption spectra and the extent of crystallinity of the face‐centered cubic structure by x rays. Thickness‐dependent optical and electrical measurements reveal uniform films over the thickness range 200–1000 A. We obtain optical absorption coefficients having values between those of Si and Ge and a relative permittivity having a value close to that of amorphous SiO2.

R. M. Fleming

Papers

C60 thin film transistors

Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO3) isotropic metallic oxide electrodes

Discovery of a useful thin-film dielectric using a composition-spread approach

Very large magnetoresistance in perovskite‐like La‐Ca‐Mn‐O thin films

Deposition and characterization of fullerene films