R
R. Prasanna Venkatesh
Researcher at Indian Institute of Technology Guwahati
Publications - 17
Citations - 221
R. Prasanna Venkatesh is an academic researcher from Indian Institute of Technology Guwahati. The author has contributed to research in topics: Ionic liquid & Surface roughness. The author has an hindex of 7, co-authored 16 publications receiving 148 citations. Previous affiliations of R. Prasanna Venkatesh include Hanyang University.
Papers
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Characterization of TMAH based cleaning solution for post Cu-CMP application
TL;DR: In this paper, a tetra methyl ammonium hydroxide (TMAH) was used as the cleaning agent and arginine as the chelating agent to remove BTA and silica particles from the copper surface.
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Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process
TL;DR: In this article, the Kramers Kronig transform software was used for the analysis of Kwon et al.'s work in the context of International Cooperation Program (# 2011-0027711) and Basic Science Research Program (# R11-2008-044-02000-0) through National Research Foundation of Korea (NRF) funded by the Ministry of Education, Science and Technology.
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Removal of Cr(VI) from synthetic solutions using water caltrop shell as a low-cost biosorbent
TL;DR: Water caltrop (WC) shell was investigated as a potential biosorbent for the removal of Cr(VI) ions from aqueous solutions as discussed by the authors, and the FT-IR spectrum of WC exhibited different functional groups such as...
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Ionic-Liquid-Based Deep Eutectic Solvents as Novel Electrolytes for Supercapacitors: COSMO-SAC Predictions, Synthesis, and Characterization
Upasana Mahanta,Sambita Choudhury,R. Prasanna Venkatesh,Sujatha SarojiniAmma,S. A. Ilangovan,Tamal Banerjee +5 more
TL;DR: In this article, the authors investigated two ionic-liquid-based deep eutectic solvents (DESs) composed of ethylene glycol (EG) and N-methylacetamide (NMAc) as hydrogen bond donors (HBD) and high melting point.
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Influence of anionic polyelectrolyte addition on ceria dispersion behavior for quartz chemical mechanical polishing
TL;DR: In this article, the effect of anionic dispersant, poly(acrylic acid-co maleic acid) sodium salt on ceria (CeO 2 ) slurry stability was investigated for quartz chemical mechanical polishing (CMP) applications.