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R. Ramaseshan

Bio: R. Ramaseshan is an academic researcher from Indira Gandhi Centre for Atomic Research. The author has contributed to research in topics: Thin film & Nanoindentation. The author has an hindex of 14, co-authored 24 publications receiving 517 citations. Previous affiliations of R. Ramaseshan include Osaka Prefecture University & Indian Institute of Technology Madras.

Papers
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TL;DR: In this paper, the composites with and without impurities, Ni, Cl and P, were prepared by combustion reaction from the elemental powders and cast after arc melting, and the resulting composites had about 18vol% Ti2AlC in the lamellar matrix consisting of -TiAl and Ti3Al (2).

66 citations

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TL;DR: In this paper, Zr-N thin films were deposited on Si (1/0/0) substrate by reactive sputtering using a pulsed DC magnetron sputtering technique and the chemical bonding characteristics of the films were analyzed by X-ray photoelectron spectroscopy.

54 citations

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TL;DR: In this article, aluminum oxide (Al 2 O 3 ) thin films were characterized by X-ray diffraction, transmission electron microscopy, atomic force microscopy (AFM), spectroscopic ellipsometry, and UV-visible spectroscopy.

42 citations

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TL;DR: In this paper, the effect of annealing temperature of target on the texture of thin films coated by electron beam physical vapor deposition method was reported, which indicated the presence of higher oxygen vacancy concentration in SDC as well as a decrease in Ce3+ concentration with target annaling temperature.
Abstract: In this paper, we report the effect of annealing temperature of target on the texture of thin films coated by electron beam physical vapor deposition method. Nanocrystalline cerium oxide (CeO2) and 20 mol% samarium doped cerium oxide (SDC) powders, compacted into pellets, were used as targets after annealing at 300, 500 and 800 °C. Grain size analysis of the target by X-ray diffraction showed a size range of 12–52 nm and 9–22 nm for CeO2 and SDC, respectively. Texture coefficient calculation from glancing incident X-ray diffraction showed a preferential orientation of (111) in CeO2 films. However SDC films exhibited (200) orientation grown at the expense of (111) which resulted in higher residual strain with annealing temperature. The pole figure analysis elucidated smaller in-plane misorientation in CeO2 than in SDC films. Under similar deposition conditions, difference in textured growth between CeO2 and SDC is primarily induced by vapor pressure modifications associated with the annealing temperature of the target. Raman and X-ray photoelectron spectroscopic studies of the films indicate the presence of higher oxygen vacancy concentration in SDC as well as a decrease in Ce3+ concentration with target annealing temperature.

41 citations

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TL;DR: In this article, the surface of 316L stainless steel (316L SS) is irradiated by high energy low current DC electron beam (HELCDEB) with energy of 500 keV and beam current of 1.5

40 citations


Cited by
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08 Dec 2001-BMJ
TL;DR: There is, I think, something ethereal about i —the square root of minus one, which seems an odd beast at that time—an intruder hovering on the edge of reality.
Abstract: There is, I think, something ethereal about i —the square root of minus one. I remember first hearing about it at school. It seemed an odd beast at that time—an intruder hovering on the edge of reality. Usually familiarity dulls this sense of the bizarre, but in the case of i it was the reverse: over the years the sense of its surreal nature intensified. It seemed that it was impossible to write mathematics that described the real world in …

33,785 citations

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TL;DR: This absorber integrates both the plasmonic resonances and the dielectric-like loss and opens a path for the interesting applications such as solar thermophotovoltaics and optical circuits.
Abstract: A high-temperature stable broadband plasmonic absorber is designed, fabricated, and optically characterized. A broadband absorber with an average high absorption of 95% and a total thickness of 240 nm is fabricated, using a refractory plasmonic material, titanium nitride. This absorber integrates both the plasmonic resonances and the dielectric-like loss. It opens a path for the interesting applications such as solar thermophotovoltaics and optical circuits.

597 citations

Journal ArticleDOI
TL;DR: In this paper, the development trend of modification on high temperature oxidation resistance of titanium alloys and titanium aluminides in the future is forecasted, including whole alloying modification and surface modification.

325 citations

Journal ArticleDOI
TL;DR: In this article, a brief discussion on alternative plasmonic materials for localized surface plasmor applications and focuses on transition metal nitrides, in particular, titanium nitride, which has recently been shown to be a high performance refractory material that could replace and even outperform gold in various plammonic devices.

319 citations