Rajiv V. Joshi

Bio: Rajiv V. Joshi is an academic researcher from IBM. The author has contributed to research in topics: Static random-access memory & CMOS. The author has an hindex of 41, co-authored 309 publications receiving 6117 citations. Previous affiliations of Rajiv V. Joshi include National University of Singapore.

Turning silicon on its edge [double gate CMOS/FinFET technology]

Abstract: Double-gate devices will enable the continuation of CMOS scaling after conventional scaling has stalled. DGCMOS/FinFET technology offers a tactical solution to the gate dielectric barrier and a strategic path for silicon scaling to the point where only atomic fluctuations halt further progress. The conventional nature of the processes required to fabricate these structures has enabled rapid experimental progress in just a few years. Fully integrated CMOS circuits have been demonstrated in a 180 nm foundry-compatible process, and methods for mapping conventional, planar CMOS product designs to FinFET have been developed. For both low-power and high-performance applications, DGCMOS-FinFET offers a most promising direction for continued progress in VLSI.

Mixture importance sampling and its application to the analysis of SRAM designs in the presence of rare failure events

Abstract: In this paper, we propose a novel methodology for statistical SRAM design and analysis. It relies on an efficient form of importance sampling, mixture importance sampling. The method is comprehensive, computationally efficient and the results are in excellent agreement with those obtained via standard Monte Carlo techniques. All this comes at significant gains in speed and accuracy, with speedup of more than 100/spl times/ compared to regular Monte Carlo. To the best of our knowledge, this is the first time such a methodology is applied to the analysis of SRAM designs.

Formation of self-aligned metal gate FETs using a benignant removable gate material during high temperature steps

Abstract: A sub-micron FET is disclosed made by a method using expendable self-aligned gate structure up to and including the step of annealing the source/drain regions. The source/drain regions are formed by ion implantation using the expendable structure (diamond-like-carbon) as a mask. After the expendable structure has performed its further purpose of protecting the gate dielectric from contamination during the annealing cycle, the structure is easily removed by O 2 plasma and replaced by a conventional metal gate material.

A 2-ns cycle, 3.8-ns access 512-kb CMOS ECL SRAM with a fully pipelined architecture

Abstract: The authors describe a 512 K CMOS static RAM (SRAM) with emitter-coupled-logic (ECL) interfaces which has a 2-ns cycle time and a 3.8-ns access time, both of which are valid for random READ/WRITE operations. The CMOS technology and the physical organization of the chip are briefly discussed, and the pipelined architecture of the chip is described. Detailed measurements of internal chip waveforms demonstrating 2-ns cycle time operation are presented. The impact of wire RC delays on performance is discussed. Circuit examples that demonstrate the implementation of the pipelined architecture are included. Measurements of operating margins, access time, and cycle time are outlined. >

A novel sram cell design to improve stability

Abstract: The present invention relates to a novel semiconductor SRAM cell structure that includes at least two pull-up transistors, two pull-down transistors, and two pass-gate transistors. In one embodiment, an 8T SRAM cell structure implements a series gating feature for implementing Column Select (CS) and Row Select (WL) cell storage access with enhanced stability. Particularly, the 8-T approach adds two pass-gates, two series connected transistor devices connected at complementary nodes of two cross-coupled inverters, to control column select and row (word) select. In the other embodiment, a 9T SRAM cell structure includes a transmission gate to implement Column Select (CS) and Row Select (WL) cell storage access with enhanced stability. The 9-T approach adds three transistors to perform ANDING function to separate the row select and column select signal functions. Both methods improve stability by eliminating half-select mode and facilitate rail to rail data transfer in and out of the SRAM cell without disturbing the other cells.

Stretchable form of single crystal silicon for high performance electronics on rubber substrates

Abstract: The present invention provides stretchable, and optionally printable, semiconductors and electronic circuits capable of providing good performance when stretched, compressed, flexed or otherwise deformed. Stretchable semiconductors and electronic circuits of the present invention preferred for some applications are flexible, in addition to being stretchable, and thus are capable of significant elongation, flexing, bending or other deformation along one or more axes. Further, stretchable semiconductors and electronic circuits of the present invention may be adapted to a wide range of device configurations to provide fully flexible electronic and optoelectronic devices.

Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors

Abstract: For more than four decades, transistors have been shrinking exponentially in size, and therefore the number of transistors in a single microelectronic chip has been increasing exponentially. Such an increase in packing density was made possible by continually shrinking the metal–oxide–semiconductor field-effect transistor (MOSFET). In the current generation of transistors, the transistor dimensions have shrunk to such an extent that the electrical characteristics of the device can be markedly degraded, making it unlikely that the exponential decrease in transistor size can continue. Recently, however, a new generation of MOSFETs, called multigate transistors, has emerged, and this multigate geometry will allow the continuing enhancement of computer performance into the next decade.

CACTI: an enhanced cache access and cycle time model

Abstract: This paper describes an analytical model for the access and cycle times of on-chip direct-mapped and set-associative caches. The inputs to the model are the cache size, block size, and associativity, as well as array organization and process parameters. The model gives estimates that are within 6% of Hspice results for the circuits we have chosen. This model extends previous models and fixes many of their major shortcomings. New features include models for the tag array, comparator, and multiplexor drivers, nonstep stage input slopes, rectangular stacking of memory subarrays, a transistor-level decoder model, column-multiplexed bitlines controlled by an additional array organizational parameter, load-dependent size transistors for wordline drivers, and output of cycle times as well as access times. Software implementing the model is available via ftp.

Three-dimensional integrated circuits

Abstract: Three-dimensional (3D) integrated circuits (ICs), which contain multiple layers of active devices, have the potential to dramatically enhance chip performance, functionality, and device packing density. They also provide for microchip architecture and may facilitate the integration of heterogeneous materials, devices, and signals. However, before these advantages can be realized, key technology challenges of 3D ICs must be addressed. More specifically, the processes required to build circuits with multiple layers of active devices must be compatible with current state-of-the-art silicon processing technology. These processes must also show manufacturability, i.e., reliability, good yield, maturity, and reasonable cost. To meet these requirements, IBM has introduced a scheme for building 3D ICs based on the layer transfer of functional circuits, and many process and design innovations have been implemented. This paper reviews the process steps and design aspects that were developed at IBM to enable the formation of stacked device layers. Details regarding an optimized layer transfer process are presented, including the descriptions of 1) a glass substrate process to enable through-wafer alignment; 2) oxide fusion bonding and wafer bow compensation methods for improved alignment tolerance during bonding; 3) and a single-damascene patterning and metallization method for the creation of high-aspect-ratio (6:1 108 vias/cm2), and extremely aggressive wafer-to-wafer alignment (submicron) capability.