R
Rao Tummala
Researcher at Georgia Institute of Technology
Publications - 628
Citations - 12781
Rao Tummala is an academic researcher from Georgia Institute of Technology. The author has contributed to research in topics: Interposer & Capacitor. The author has an hindex of 43, co-authored 623 publications receiving 11663 citations. Previous affiliations of Rao Tummala include Qualcomm & IBM.
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Proceedings ArticleDOI
Novel copper metallization schemes on ultra-thin, bare glass interposers with through-vias
TL;DR: In this paper, a new approach was proposed to create a glass interposer structure with through-vias that is ready for solution-based metallization such as electroless deposition.
Proceedings ArticleDOI
Low temperature (<100/spl deg/C) hydrothermal synthesis of high K-low loss BaTiO/sub 3/ films for integral capacitors
TL;DR: In this paper, the authors reported synthesis of low loss hydrothermal BaTiO/sub 3/ thin films via a low temperature process -hydrothermal synthesis at 95/spl deg/C on laminated titanium foils.
Proceedings ArticleDOI
Reliability Studies of 5 µm Diameter Photo Vias with Daisy Chain Resistance Using Dry Film Photosensitive Dielectric Material
Atsushi Kubo,Chandrasekharan Nair,Bartlet H. DeProspo,Fuhan Liu,Tomoyuki Ando,Venky Sundaram,Rao Tummala +6 more
TL;DR: In this article, the authors demonstrate reliability of via diameter below 5 µm using panel-scalable dry film photosensitive dielectric, which enables high density redistribution layer (RDL) technology for panel-based fan-out and interposer substrates.
Proceedings ArticleDOI
New package/board materials technology for next-generation convergent microsystems
Nitesh Kumbhat,Pulugurtha Markondeya Raj,S. Bansal,R. Doraiswami,Swapan K. Bhattacharya,Rao Tummala,S. Hayes,S. Atmur +7 more
TL;DR: In this paper, the failure modes indicate that a combination of high dielectric stresses and warpage results in crack propagation in conventional epoxies and copper wiring, while the high stiffness (>350 GPa) ceramic boards did not fail even after 1000 cycles.
Proceedings ArticleDOI
Cu Pillar with Nanocopper Caps: The Next Interconnection Node Beyond Traditional Cu Pillar
TL;DR: In this paper, the authors proposed a novel interconnection technology -Cu pillar with nanocopper caps -where a solid-state sub-20 GPa modulus nanoporous Cu cap is introduced to replace the solder cap and retain solder-like compliance in assembly, while achieving bulk-like properties through densification in low-temperature sintering.