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Rao Tummala

Researcher at Georgia Institute of Technology

Publications -  628
Citations -  12781

Rao Tummala is an academic researcher from Georgia Institute of Technology. The author has contributed to research in topics: Interposer & Capacitor. The author has an hindex of 43, co-authored 623 publications receiving 11663 citations. Previous affiliations of Rao Tummala include Qualcomm & IBM.

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Proceedings ArticleDOI

New 3D chip stacking SIP technology by wire-on-bump (WOB) and bump-on-flex (BOF)

TL;DR: In this article, two new 3D chip stacking technologies, WOB (wire-on-bumps) and BOF (bump-onflex), are proposed and demonstrated with their prototypes.
Proceedings ArticleDOI

Overview of IBM glass ceramic packaging technology

TL;DR: In this article, the ES9000 glass-ceramic/copper substrate has been used for high-end machines including supercomputer applications and two technology alternatives are discussed in this paper, both aimed at achieving high density, yet they differ quite a bit in their applications.
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Co-Design and Demonstration of a Fully Integrated Optical Transceiver Package Featuring Optical, Electrical, and Thermal Interconnects in Glass Substrate

TL;DR: In this article, a glass package that emulates a 400 Gbps optical transceiver module was designed and demonstrated using a panel scalable process flow developed by the authors with shared steps.
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A novel non-solder based board-to-board interconnection technology for smart mobile and wearable electronics

TL;DR: In this article, the first demonstration of a novel concept for an ultra-high density and low-cost, non-solder based interconnection technology, which can be applied for miniaturized board-to-board (BTB) as well as 2nd level package-to system board interconnections, is reported.
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Demonstration of Embedded Cu Trench RDL using Panel Scale Lithography and Photosensitive Dry Film Polymer Dielectrics

TL;DR: In this paper, a fine pitch embedded trench RDL was demonstrated on glass substrates using a new family of ultra-high resolution dry film photo-sensitive polymer dielectrics and a new large area panel scale lithography tool.