Richard S. Muller

TL;DR: In this article, the authors present a list of symbols for metal-oxide-silicon systems, including Mos Field-effect transistors, high-field effects, and high-frequency effects.

TL;DR: The etch rates for 317 combinations of 16 materials (single-crystal silicon, doped, and undoped polysilicon, several types of silicon dioxide, stoichiometric and silicon-rich silicon nitride, aluminum, tungsten, titanium, Ti/W alloy, and two brands of positive photoresist) used in the fabrication of microelectromechanical systems and integrated circuits in 28 wet, plasma, and plasmaless-gas-phase etches (several HF solutions, H/sub 3/PO/sub 4), HNO/sub

TL;DR: In this paper, the authors present a list of symbols for metal-oxide-silicon systems, including Mos Field-effect transistors, high-field effects, and high-frequency effects.

TL;DR: Surface micromachining is characterized by the fabrication of micromechanical structures from deposited thin films as discussed by the authors, which typically requires that they be freed from the planar substrate.

TL;DR: In this paper, the authors describe the design, fabrication and operation of several micromotors that have been produced using integrated-circuit processing and demonstrate that rotors and stators for these motors are formed from polycrystalline silicon 1.0-1.5 μm thick.