Rishikesh Kulkarni

Bio: Rishikesh Kulkarni is an academic researcher from Indian Institute of Technology Guwahati. The author has contributed to research in topics: Holographic interferometry & Phase (waves). The author has an hindex of 9, co-authored 46 publications receiving 248 citations. Previous affiliations of Rishikesh Kulkarni include École Polytechnique Fédérale de Lausanne & École Polytechnique.

Phase unwrapping algorithm using polynomial phase approximation and linear Kalman filter.

Abstract: A noise-robust phase unwrapping algorithm is proposed based on state space analysis and polynomial phase approximation using wrapped phase measurement. The true phase is approximated as a two-dimensional first order polynomial function within a small sized window around each pixel. The estimates of polynomial coefficients provide the measurement of phase and local fringe frequencies. A state space representation of spatial phase evolution and the wrapped phase measurement is considered with the state vector consisting of polynomial coefficients as its elements. Instead of using the traditional nonlinear Kalman filter for the purpose of state estimation, we propose to use the linear Kalman filter operating directly with the wrapped phase measurement. The adaptive window width is selected at each pixel based on the local fringe density to strike a balance between the computation time and the noise robustness. In order to retrieve the unwrapped phase, either a line-scanning approach or a quality guided strategy of pixel selection is used depending on the underlying continuous or discontinuous phase distribution, respectively. Simulation and experimental results are provided to demonstrate the applicability of the proposed method.

Measurement of in-plane and out-of-plane displacements and strains using digital holographic moiré

Abstract: The paper proposes a non-destructive method for simultaneous measurement of in-plane and out-of-plane displacements and strains undergone by a deformed specimen from a single moire fringe pattern obtained on the specimen in a dual beam digital holographic interferometry setup. The moire fringe pattern encodes multiple interference phases which carry the information on multidimensional deformation. The interference field is segmented in each column and is modeled as multicomponent quadratic/cubic frequency-modulated signal in each segment. Subsequently, the product form of modified cubic phase function is used for accurate estimation of phase parameters. The estimated phase parameters are further utilized for direct estimation of the unwrapped interference phases and phase derivatives. The simulation and experimental results are provided to validate the effectiveness of the proposed method.

Fourier-transform method of fringe-pattern analysis for computer-based topography and interferometry

Abstract: A fast-Fourier-transform method of topography and interferometry is proposed. By computer processing of a noncontour type of fringe pattern, automatic discrimination is achieved between elevation and depression of the object or wave-front form, which has not been possible by the fringe-contour-generation techniques. The method has advantages over moire topography and conventional fringe-contour interferometry in both accuracy and sensitivity. Unlike fringe-scanning techniques, the method is easy to apply because it uses no moving components.

Digital wavefront measuring interferometer for testing optical surfaces and lenses

Abstract: A self-scanned 1024 element photodiode array and minicomputer are used to measure the phase (wavefront) in the interference pattern of an interferometer to lambda/100. The photodiode array samples intensities over a 32 x 32 matrix in the interference pattern as the length of the reference arm is varied piezoelectrically. Using these data the minicomputer synchronously detects the phase at each of the 1024 points by a Fourier series method and displays the wavefront in contour and perspective plot on a storage oscilloscope in less than 1 min (Bruning et al. Paper WE16, OSA Annual Meeting, Oct. 1972). The array of intensities is sampled and averaged many times in a random fashion so that the effects of air turbulence, vibrations, and thermal drifts are minimized. Very significant is the fact that wavefront errors in the interferometer are easily determined and may be automatically subtracted from current or subsequent wavefrots. Various programs supporting the measurement system include software for determining the aperture boundary, sum and difference of wavefronts, removal or insertion of tilt and focus errors, and routines for spatial manipulation of wavefronts. FFT programs transform wavefront data into point spread function and modulus and phase of the optical transfer function of lenses. Display programs plot these functions in contour and perspective. The system has been designed to optimize the collection of data to give higher than usual accuracy in measuring the individual elements and final performance of assembled diffraction limited optical systems, and furthermore, the short loop time of a few minutes makes the system an attractive alternative to constraints imposed by test glasses in the optical shop.

Deep learning in optical metrology: a review

Abstract: Abstract With the advances in scientific foundations and technological implementations, optical metrology has become versatile problem-solving backbones in manufacturing, fundamental research, and engineering applications, such as quality control, nondestructive testing, experimental mechanics, and biomedicine. In recent years, deep learning, a subfield of machine learning, is emerging as a powerful tool to address problems by learning from data, largely driven by the availability of massive datasets, enhanced computational power, fast data storage, and novel training algorithms for the deep neural network. It is currently promoting increased interests and gaining extensive attention for its utilization in the field of optical metrology. Unlike the traditional “physics-based” approach, deep-learning-enabled optical metrology is a kind of “data-driven” approach, which has already provided numerous alternative solutions to many challenging problems in this field with better performances. In this review, we present an overview of the current status and the latest progress of deep-learning technologies in the field of optical metrology. We first briefly introduce both traditional image-processing algorithms in optical metrology and the basic concepts of deep learning, followed by a comprehensive review of its applications in various optical metrology tasks, such as fringe denoising, phase retrieval, phase unwrapping, subset correlation, and error compensation. The open challenges faced by the current deep-learning approach in optical metrology are then discussed. Finally, the directions for future research are outlined.

Deep learning in optical metrology: a review

Abstract: Abstract With the advances in scientific foundations and technological implementations, optical metrology has become versatile problem-solving backbones in manufacturing, fundamental research, and engineering applications, such as quality control, nondestructive testing, experimental mechanics, and biomedicine. In recent years, deep learning, a subfield of machine learning, is emerging as a powerful tool to address problems by learning from data, largely driven by the availability of massive datasets, enhanced computational power, fast data storage, and novel training algorithms for the deep neural network. It is currently promoting increased interests and gaining extensive attention for its utilization in the field of optical metrology. Unlike the traditional “physics-based” approach, deep-learning-enabled optical metrology is a kind of “data-driven” approach, which has already provided numerous alternative solutions to many challenging problems in this field with better performances. In this review, we present an overview of the current status and the latest progress of deep-learning technologies in the field of optical metrology. We first briefly introduce both traditional image-processing algorithms in optical metrology and the basic concepts of deep learning, followed by a comprehensive review of its applications in various optical metrology tasks, such as fringe denoising, phase retrieval, phase unwrapping, subset correlation, and error compensation. The open challenges faced by the current deep-learning approach in optical metrology are then discussed. Finally, the directions for future research are outlined.

Deep neural networks for single shot structured light profilometry

Abstract: In 3D optical metrology, single-shot structured light profilometry techniques have inherent advantages over their multi-shot counterparts in terms of measurement speed, optical setup simplicity, and robustness to motion artifacts. In this paper, we present a new approach to extract height information from single deformed fringe patterns, based entirely on deep learning. By training a fully convolutional neural network on a large set of simulated height maps with corresponding deformed fringe patterns, we demonstrate the ability of the network to obtain full-field height information from previously unseen fringe patterns with high accuracy. As an added benefit, intermediate data processing steps such as background masking, noise reduction and phase unwrapping that are otherwise required in classic demodulation strategies, can be learned directly by the network as part of its mapping function.