Learn the basic properties and designs of modern VLSI devices, as well as the factors affecting performance, with this thoroughly updated second edition. The first edition has been widely adopted as a standard textbook in microelectronics in many major US universities and worldwide. The internationally-renowned authors highlight the intricate interdependencies and subtle tradeoffs between various practically important device parameters, and also provide an in-depth discussion of device scaling and scaling limits of CMOS and bipolar devices. Equations and parameters provided are checked continuously against the reality of silicon data, making the book equally useful in practical transistor design and in the classroom. Every chapter has been updated to include the latest developments, such as MOSFET scale length theory, high-field transport model, and SiGe-base bipolar devices.

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Fundamentals of Modern VLSI Devices

High leakage current in deep-submicrometer regimes is becoming a significant contributor to power dissipation of CMOS circuits as threshold voltage, channel length, and gate oxide thickness are reduced. Consequently, the identification and modeling of different leakage components is very important for estimation and reduction of leakage power, especially for low-power applications. This paper reviews various transistor intrinsic leakage mechanisms, including weak inversion, drain-induced barrier lowering, gate-induced drain leakage, and gate oxide tunneling. Channel engineering techniques including retrograde well and halo doping are explained as means to manage short-channel effects for continuous scaling of CMOS devices. Finally, the paper explores different circuit techniques to reduce the leakage power consumption.

Leakage current mechanisms and leakage reduction techniques in deep-submicrometer CMOS circuits

An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.

Semiconductor device, and manufacturing method thereof

Emerging challenges and materials for thermal management of electronics

Our challenge is clear: The drive for performance and the end of voltage scaling have made power, and not the number of transistors, the principal factor limiting further improvements in computing performance. Continuing to scale compute performance will require the creation and effective use of new specialized compute engines, and will require the participation of application experts to be successful. If we play our cards right, and develop the tools that allow our customers to become part of the design process, we will create a new wave of innovative and efficient computing devices.

1.1 Computing's energy problem (and what we can do about it)

To a large extent, scaling was not seriously challenged in the past. However, a closer look reveals that early signs of scaling limits were seen in high-performance devices in recent technology nodes. To obtain the projected performance gain of 30% per generation, device designers have been forced to relax the device subthreshold leakage continuously from one to several nA/µm for the 250-nm node to hundreds of nA/µm for the 65-nm node. Consequently, passive power density is now a significant portion of the power budget of a high-speed microprocessor. In this paper we discuss device and material options to improve device performance when conventional scaling is power-constrained. These options can be separated into three categories: improved short-channel behavior, improved current drive, and improved switching behavior. In the first category fall advanced dielectrics and multi-gate devices. The second category comprises mobility-enhancing measures through stress and substrate material alternatives. The third category focuses mainly on scaling of SOI body thickness to reduce capacitance. We do not provide details of the fabrication of these different device options or the manufacturing challenges that must be met. Rather, we discuss the fundamental scaling issues related to the various device options. We conclude with a brief discussion of the ultimate FET close to the fundamental silicon device limit.

Silicon CMOS devices beyond scaling

An eight-transistor (8T) cell is proposed to improve variability tolerance and low-voltage operation in high-speed SRAM caches. While the cell itself can be designed for exceptional stability and write margins, array-level implications must also be considered to achieve a viable memory solution. These constraints can be addressed by modifying traditional 6T-SRAM techniques and conceding some design complexity and area penalties. Altogether, 8T-SRAM can be designed without significant area penalty over 6T-SRAM while providing substantially improved variability tolerance and low-voltage operation with no need for secondary or dynamic power supplies. The proposed 8T solution is demonstrated in a high-performance 32 kb subarray designed in 65 nm PD-SOI CMOS that operates at 5.3 GHz at 1.2 V and 295 MHz at 0.41 V.

An 8T-SRAM for Variability Tolerance and Low-Voltage Operation in High-Performance Caches

Short, medium, and long on-chip interconnections having linewidths of 0.45-52 /spl mu/m are analyzed in a five-metal-layer structure. We study capacitive coupling for short lines, inductive coupling for medium-length lines, inductance and resistance of the current return path in the power buses, and line resistive losses for the global wiring. Design guidelines and technology changes are proposed to achieve minimum delay and contain crosstalk for local and global wiring. Conditional expressions are given to determine when transmission-line effects are important for accurate delay and crosstalk prediction.

When are transmission-line effects important for on-chip interconnections?

Field-effect transistor memory

An approach is described for determining the hot-electron-limited voltages for silicon MOSFET's of small dimensions. The approach was followed in determining the room-temperature and the 77 K hot-electron-limited voltages for a device designed to have a minimum channel length of 1 µm. The substrate hot-electron limits were determined empirically from measurements of the emission probabilities as a function of voltage using devices of reentrant geometry. The channel hot-electron limits were determined empirically from measurements of the injection current as a function of voltage and from long-term stress experiments. For the 1 µm design considered, the channel hot-electron limits are lower than the substrate hot-electron limits. The maximum voltage, V_{DS} = V_{GS} , is 4.75 V at room temperature (25°C) and 3.5 V at 77 K. More details of the voltage limits as well as the approach for determining them are discussed. Examples of circuits designed with these devices to operate within these hot-electron voltage limits are also discussed.

Robert H. Dennard

Papers

Silicon CMOS devices beyond scaling

An 8T-SRAM for Variability Tolerance and Low-Voltage Operation in High-Performance Caches

When are transmission-line effects important for on-chip interconnections?

Field-effect transistor memory

1 µm MOSFET VLSI technology: Part IV—Hot-electron design constraints

Robert H. Dennard

Papers

Silicon CMOS devices beyond scaling

An 8T-SRAM for Variability Tolerance and Low-Voltage Operation in High-Performance Caches

When are transmission-line effects important for on-chip interconnections?

Field-effect transistor memory

1 &#181;m MOSFET VLSI technology: Part IV&#8212;Hot-electron design constraints

1 µm MOSFET VLSI technology: Part IV—Hot-electron design constraints