R
Robert Muller
Researcher at Katholieke Universiteit Leuven
Publications - 55
Citations - 2084
Robert Muller is an academic researcher from Katholieke Universiteit Leuven. The author has contributed to research in topics: Thin-film transistor & Thin film. The author has an hindex of 22, co-authored 55 publications receiving 1944 citations.
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Polymer and Organic Nonvolatile Memory Devices
TL;DR: In this article, the role of π-conjugated materials in the operation of nonvolatile memory devices is reviewed and a review of the state of the art with respect to these target specifications is presented.
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Influence of cathode oxidation via the hole extraction layer in polymer:fullerene solar cells
TL;DR: In this article, the role of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) in the degradation of polymer:PCBM ((6,6)-phenyl C61-butyric acid methyl ester) solar cells was elucidated.
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On the Role of Bathocuproine in Organic Photovoltaic Cells
Hans Gommans,Bregt Verreet,Barry P. Rand,Robert Muller,Jef Poortmans,Paul Heremans,Jan Genoe +6 more
TL;DR: In this article, the effect of bathocuproine (BCP) on the optical and electrical properties of organic planar heterounction photovoltaic cells is quantified by current-voltage characterization under 1 sun AM 1.5D simulated solar illumination and spectral response at short-circuit conditions.
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High-Performance Flexible Bottom-Gate Organic Field-Effect Transistors with Gravure Printed Thin Organic Dielectric
Nikolay L. Vaklev,Robert Muller,Beinn V. O. Muir,David James,Roger Pretot,Paul Adriaan Van Der Schaaf,Jan Genoe,Ji-Seon Kim,Joachim H. G. Steinke,Alasdair J. Campbell +9 more
TL;DR: OFETs with a bottom-gate (BG) bottom-contact (BC) geometry have an advantage in that the organic semiconducting layer is deposited last, allowing easy fabrication and patterning of micron-scale OFET channels, electrodes and interconnects by conventional photolithographic methods.
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Influence of the Cu-Te composition and microstructure on the resistive switching of Cu-Te/Al2O3/Si cells
Ludovic Goux,Karl Opsomer,Robin Degraeve,Robert Muller,Christophe Detavernier,Dirk J. Wouters,M. Jurczak,L. Altimime,Jorge A. Kittl +8 more
TL;DR: In this paper, the authors explore the influence of the CuxTe1-x layer composition (0.2, 0.3, and 0.7) on program control and filament stability.