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Ryoichi Akimoto

Researcher at National Institute of Advanced Industrial Science and Technology

Publications -  124
Citations -  939

Ryoichi Akimoto is an academic researcher from National Institute of Advanced Industrial Science and Technology. The author has contributed to research in topics: Quantum well & Waveguide (optics). The author has an hindex of 15, co-authored 122 publications receiving 883 citations.

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All-optical demultiplexing of 160–10Gbit∕s signals with Mach-Zehnder interferometric switch utilizing intersubband transition in InGaAs∕AlAs∕AlAsSb quantum well

TL;DR: In this article, a Mach-Zehnder interferometric all-optical switch employing intersubband transition in an InGaAs∕AlAs ∕AlSb-coupled double quantum well waveguide was developed.
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Short-wavelength intersubband transitions down to 1.6 μm in ZnSe/BeTe type-II superlattices

TL;DR: In this article, photoinduced electron intersubband absorption in ZnSe/BeTe type-II superlattices was shown to increase sublinearly with pump intensity, reflecting the characteristic recombination processes of electron-hole pairs in a heterostructure with type II band alignment.
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Subpicosecond saturation of intersubband absorption in (CdS∕ZnSe)∕BeTe quantum-well waveguides at telecommunication wavelength

TL;DR: In this paper, a waveguide structure consisting of a CdS∕ZnSe∕BeTe MQW core layer and two top and bottom ZnMgBeSe quaternary cladding layers grown by molecular beam epitaxy on a (001) GaAs substrate was investigated by utilizing an ISBT of II-VI-based multiple quantum wells (MQWs) fabricated in high-mesa waveguide devices.
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Sub-picosecond electron relaxation of near-infrared intersubband transitions in n-doped (CdS/ZnSe)/BeTe quantum wells

TL;DR: In this paper, the authors reported on intersubband (ISB) absorption and ultrafast ISB energy relaxation of carriers in n-type doped (CdS/ZnSe)/BeTe quantum wells (QWs), grown by molecular-beam epitaxy.
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A Three-Dimensional Silicon Nitride Polarizing Beam Splitter

TL;DR: In this paper, a 3D polarizing beam splitter based on a silicon nitride (Si3N4) vertical directional coupler is experimentally demonstrated, where a new planarization technique by incorporating conventional chemical-mechanical lapping with a dry-etching process is developed, in order to obtain a flat film surface for the second Si3N 4 core deposition after the first-layer waveguide is formed.