S.C. Rustagi

Bio: S.C. Rustagi is an academic researcher from Singapore Science Park. The author has contributed to research in topics: MOSFET & CMOS. The author has an hindex of 11, co-authored 23 publications receiving 629 citations.

Si, SiGe Nanowire Devices by Top–Down Technology and Their Applications

Abstract: Nanowire (NW) devices, particularly the gate-all-around (GAA) CMOS architecture, have emerged as the front-runner for pushing CMOS scaling beyond the roadmap. These devices offer unique advantages over their planar counterparts which make them feasible as an option for 22 -nm and beyond technology nodes. This paper reviews the current technology status for realizing the GAA NW device structures and their applications in logic circuit and nonvolatile memories. We also take a glimpse into applications of NWs in the ldquomore-than-Moorerdquo regime and briefly discuss the application of NWs as biochemical sensors. Finally, we summarize the status and outline the challenges and opportunities of the NW technology.

Vertically Stacked SiGe Nanowire Array Channel CMOS Transistors

Abstract: We demonstrate, for the first time, the fabrication of vertically stacked SiGe nanowire (NW) arrays with a fully CMOS compatible technique. Our method uses the phenomenon of Ge condensation onto Si and the faster oxidation rate of SiGe than Si to realize the vertical stacking of NWs. Gate-all-around nand p-FETs, fabricated using these stacked NW arrays as the channel (Lgges0.35 mum), exhibit excellent device performance with high ION/IOFF ratio (~106), near ideal subthreshold slope (~62-75 mV/dec) and low drain induced barrier-lowering (~20 mV/V). The transconductance characteristics suggest quantum confinement of holes in the [Ge]-rich outer-surface of SiGe for p-FETs and confinement of electrons in the core Si with significantly less [Ge] for n-FETs. The presented device architecture can be a promising option to overcome the low drive current restriction of Si NW MOSFETs for a given planar estate

CMOS Inverter Based on Gate-All-Around Silicon-Nanowire MOSFETs Fabricated Using Top-Down Approach

Abstract: This letter demonstrates, for the first time, the integration of gate-all-around (GAA) Si-nanowire transistors into CMOS inverters using top-down approach. With matching of the drive currents of n- and p-MOSFETs using different gate lengths to achieve symmetric pull-up and pull-down, sharp ON- OFF transitions with high voltage gains (e.g., DeltaV OUT/DeltaV IN up to ~ 40 for V DD = 1.2 V) are obtained. The inverter maintains its good transfer characteristics and noise margins for wide range of V DD tested down to 0.4 V. Individual transistors show excellent subthreshold characteristics and drive currents. The results are discussed in light of the circuit performances reported for other advanced nonclassical device architectures such as FinFETs. The integration potential of GAA Si-nanowire transistors to realize CMOS-circuit functionality is thus demonstrated.

Observation of Metal-Layer Stress on Si Nanowires in Gate-All-Around High- $\kappa$ /Metal-Gate Device Structures

Abstract: This letter reports, for the first time, the observation of mechanical stress from metal-gate layer on the Si nanowires formed by the top-down scheme. High-kappa (HfO2 ~ 5 nm) and metal-gate (TaN ~ 100 nm) are evaluated on Si nanowires having ~5-7 nm diameter. While no significant mechanical effect is observed after high-kappa deposition, the TaN metal layer is found to viciously stretch and twist the straight wires. The wire lengths increase significantly (~3%), which suggests that the Si nanowires are subjected to large tensile strain ( > 4 GPa), assuming that the wires obey Hooke's law with Young's modulus ~150 GPa for bulk Si. Interestingly, the twisted nanowires maintained their physical continuity, as demonstrated by the excellent performance of the fully functional gate-all-around MOSFETs fabricated with the wires as channels.

Gate-all-around Si-nanowire CMOS inverter logic fabricated using top-down approach

Abstract: We present, for the first time, the monolithic integration of Gate-Ail-Around (GAA) Si-nanowire FETs into CMOS logic using top-down approach. The drive currents for N-and P-MOS transistors are matched using different number of channels for each to obtain symmetric pull-up and pull-down characteristics. Sharp ON-OFF transitions with high voltage gains (up to -45) are obtained which are best reported among the nanowire and carbon nanotube inverters. The inverters maintain their good transfer characteristics and noise margins for a wide range of VDD values, down to 0.2 V. Short circuit current at 0.2 V VDD is ~6 pA indicating excellent potential of these devices for low voltage and ultra low power applications. These results excel those reported in the literature for nanowire as well as FinFET (non-classical CMOS) inverters.

Silicon Nanowires: A Review on Aspects of their Growth and their Electrical Properties

Abstract: This paper summarizes some of the essential aspects of silicon-nanowire growth and of their electrical properties. In the first part, a brief description of the different growth techniques is given, though the general focus of this work is on chemical vapor deposition of silicon nanowires. The advantages and disadvantages of the different catalyst materials for silicon-wire growth are discussed at length. Thereafter, in the second part, three thermodynamic aspects of silicon-wire growth via the vapor–liquid–solid mechanism are presented and discussed. These are the expansion of the base of epitaxially grown Si wires, a stability criterion regarding the surface tension of the catalyst droplet, and the consequences of the Gibbs–Thomson effect for the silicon wire growth velocity. The third part is dedicated to the electrical properties of silicon nanowires. First, different silicon nanowire doping techniques are discussed. Attention is then focused on the diameter dependence of dopant ionization and the influence of interface trap states on the charge carrier density in silicon nanowires. It is concluded by a section on charge carrier mobility and mobility measurements.

Toward Nanowire Electronics

Abstract: This paper discusses the electronic transport properties of nanowire field-effect transistors (NW-FETs). Four different device concepts are studied in detail: Schottky-barrier NW-FETs with metallic source and drain contacts, conventional-type NW-FETs with doped NW segments as source and drain electrodes, and, finally, two new concepts that enable steep turn-on characteristics, namely, NW impact ionization FETs and tunnel NW-FETs. As it turns out, NW-FETs are, to a large extent, determined by the device geometry, the dimensionality of the electronic transport, and the way of making contacts to the NW. Analytical as well as simulation results are compared with experimental data to explain the various factors impacting the electronic transport in NW-FETs.

Logic Gates and Computation from Assembled Nanowire Building Blocks

Abstract: I-CYP binding sites) was determinedafter 24 hours of isoproterenol treatment and ex-pressed as the percentage of receptor number as-sessed in nonstimulated cells. Where necessary,MG132 (20 mM) or lactacystin (20 mM) mixed inserum-free media was added to cells 1 hour beforestimulation.16. P. van Kerkhof, R. Govers, C. M. Alves dos Santos, G. J.Strous,

Vertical Si-Nanowire $n$ -Type Tunneling FETs With Low Subthreshold Swing ( $\leq \hbox{50}\ \hbox{mV/decade}$ ) at Room Temperature

Abstract: This letter presents a Si nanowire based tunneling field-effect transistor (TFET) using a CMOS-compatible vertical gate-all-around structure. By minimizing the thermal budget with low-temperature dopant-segregated silicidation for the source-side dopant activation, excellent TFET characteristics were obtained. We have demonstrated for the first time the lowest ever reported subthreshold swing (SS) of 30 mV/decade at room temperature. In addition, we reported a very convincing SS of 50 mV/decade for close to three decades of drain current. Moreover, our TFET device exhibits excellent characteristics without ambipolar behavior and with high Ion/Ioff ratio (105), as well as low Drain-Induced Barrier Lowering of 70 mV/V.

HfOx-based vertical resistive switching random access memory suitable for bit-cost-effective three-dimensional cross-point architecture.

Abstract: The three-dimensional (3D) cross-point array architecture is attractive for future ultra-high-density nonvolatile memory application. A bit-cost-effective technology path toward the 3D integration that requires only one critical lithography step or mask for reducing the bit-cost is demonstrated in this work. A double-layer HfOx-based vertical resistive switching random access memory (RRAM) is fabricated and characterized. The HfOx thin film is deposited at the sidewall of the predefined trench by atomic layer deposition, forming a vertical memory structure. Electrode/oxide interface engineering with a TiON interfacial layer results in nonlinear I–V suitable for the selectorless array. The fabricated HfOx vertical RRAM shows excellent performances such as reset current ( 108 cycles), read disturbance immunity (>109 cycles), and data retention time (>105 s @ 125 °C).