Sangjun Park

TL;DR: The surface/bulk micromachining (SBM) process as discussed by the authors was proposed to fabricate released microelectromechanical systems using bulk silicon, where the exposed bare silicon is further reactive ion etched, which defines sacrificial gap dimensions and the final release is accomplished by undercutting the exposed bulk silicon sidewalls in aqueous alkaline etchants.

TL;DR: In this paper, a triple-layer isolation method was proposed for high-aspect-ratio structures with sacrificial gaps, based on a single-crystalline-silicon micro-gyroscope fabricated using surface/bulk micromachining (SBM) process.

TL;DR: This paper presents electrostatic actuation of a resonator fabricated by the SBM (surface/bulk micromachining) process, and a junction isolation method using reverse-biased diodes is developed.

TL;DR: A simple, efficient, and economical process is reported for the direct synthesis of carbon nanotube (CNT) field emitters on metal alloy and an X-ray generated image of an integrated circuit was taken using the compact field emission device developed herein.

TL;DR: In this article, a 3D fabrication method for a single-crystal silicon micro-probe structure is developed, which is based on surface/bulk micromachining technology.