Seiichi Miyazaki

Bio: Seiichi Miyazaki is an academic researcher from Nagoya University. The author has contributed to research in topics: Quantum dot & X-ray photoelectron spectroscopy. The author has an hindex of 33, co-authored 467 publications receiving 4999 citations. Previous affiliations of Seiichi Miyazaki include National Institute of Advanced Industrial Science and Technology & National Institute for Materials Science.

Photoemission study of energy-band alignments and gap-state density distributions for high-k gate dielectrics

Abstract: The determination of the energy band gaps of thin-gate insulators has been demonstrated from the onsets of the energy-loss spectra of O 1s (or N 1s) photoelectrons. The valence-band lineups of thin high-dielectric-constant (high-k) dielectrics such as Ta2O5, Al2O3, and ZrO2 formed on metals and Si(100) have also been determined by measuring the energy difference between the valence-band density-of-states curves. The energy band diagrams for metal/high-k dielectrics/Si(100) systems have been derived explicitly from considering the measured band gaps, valence-band lineups, electron affinities, and metal work functions in the systems. It is also demonstrated that total photoelectron yield spectroscopy can be used to quantify the energy distributions of both the defect states in high-k gate dielectrics and at the dielectric/Si(100) interfaces over the entire Si band gap without gate formation.

Resonant tunneling through amorphous silicon-silicon nitride double-barrier structures.

Abstract: The electron tunneling through quantized states in an ultrathin hydrogenated amorphous silicon (a-Si:H) layer sandwiched with stoichiometric silicon nitride (a-${\mathrm{Si}}_{3}$${\mathrm{N}}_{4}$:H) barriers has been systematically investigated. The I-V characteristics have exhibited the current bumps arising from the resonant tunneling through the double barriers. The effective mass of tunneling electron is obtained to be 0.6${\mathrm{m}}_{0}$, being consistent with the value determined from the optical band-gap data for a-Si:H/a-${\mathrm{Si}}_{3}$${\mathrm{N}}_{4}$:H multilayers.

Diamond-like amorphous carbon

Abstract: Diamond-like carbon (DLC) is a metastable form of amorphous carbon with significant sp3 bonding. DLC is a semiconductor with a high mechanical hardness, chemical inertness, and optical transparency. This review will describe the deposition methods, deposition mechanisms, characterisation methods, electronic structure, gap states, defects, doping, luminescence, field emission, mechanical properties and some applications of DLCs. The films have widespread applications as protective coatings in areas, such as magnetic storage disks, optical windows and micro-electromechanical devices (MEMs).

Room-temperature transistor based on a single carbon nanotube

Abstract: The use of individual molecules as functional electronic devices was first proposed in the 1970s (ref 1) Since then, molecular electronics2,3 has attracted much interest, particularly because it could lead to conceptually new miniaturization strategies in the electronics and computer industry The realization of single-molecule devices has remained challenging, largely owing to difficulties in achieving electrical contact to individual molecules Recent advances in nanotechnology, however, have resulted in electrical measurements on single molecules4,5,6,7 Here we report the fabrication of a field-effect transistor—a three-terminal switching device—that consists of one semiconducting8,9,10 single-wall carbon nanotube11,12 connected to two metal electrodes By applying a voltage to a gate electrode, the nanotube can be switched from a conducting to an insulating state We have previously reported5 similar behaviour for a metallic single-wall carbon nanotube operated at extremely low temperatures The present device, in contrast, operates at room temperature, thereby meeting an important requirement for potential practical applications Electrical measurements on the nanotube transistor indicate that its operation characteristics can be qualitatively described by the semiclassical band-bending models currently used for traditional semiconductor devices The fabrication of the three-terminal switching device at the level of a single molecule represents an important step towards molecular electronics

The structural and luminescence properties of porous silicon

Abstract: A large amount of work world-wide has been directed towards obtaining an understanding of the fundamental characteristics of porous Si. Much progress has been made following the demonstration in 1990 that highly porous material could emit very efficient visible photoluminescence at room temperature. Since that time, all features of the structural, optical and electronic properties of the material have been subjected to in-depth scrutiny. It is the purpose of the present review to survey the work which has been carried out and to detail the level of understanding which has been attained. The key importance of crystalline Si nanostructures in determining the behaviour of porous Si is highlighted. The fabrication of solid-state electroluminescent devices is a prominent goal of many studies and the impressive progress in this area is described.

High dielectric constant gate oxides for metal oxide Si transistors

Abstract: The scaling of complementary metal oxide semiconductor transistors has led to the silicon dioxide layer, used as a gate dielectric, being so thin (14?nm) that its leakage current is too large It is necessary to replace the SiO2 with a physically thicker layer of oxides of higher dielectric constant (?) or 'high K' gate oxides such as hafnium oxide and hafnium silicate These oxides had not been extensively studied like SiO2, and they were found to have inferior properties compared with SiO2, such as a tendency to crystallize and a high density of electronic defects Intensive research was needed to develop these oxides as high quality electronic materials This review covers both scientific and technological issues?the choice of oxides, their deposition, their structural and metallurgical behaviour, atomic diffusion, interface structure and reactions, their electronic structure, bonding, band offsets, electronic defects, charge trapping and conduction mechanisms, mobility degradation and flat band voltage shifts The oxygen vacancy is the dominant electron trap It is turning out that the oxides must be implemented in conjunction with metal gate electrodes, the development of which is further behind Issues about work function control in metal gate electrodes are discussed