S
Sin-Liang Ou
Researcher at Dayeh University
Publications - 40
Citations - 347
Sin-Liang Ou is an academic researcher from Dayeh University. The author has contributed to research in topics: Thin film & Light-emitting diode. The author has an hindex of 9, co-authored 40 publications receiving 234 citations.
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Epitaxial Growth of ZnGa2O4: A New Deep Ultraviolet Semiconductor Candidate
TL;DR: ZnGaO films were grown on c-plane sapphire substrates by metal organic chemical vapor deposition using diethylzinc (DEZn), triethylgallium (TEGa), and oxygen as mentioned in this paper.
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Tunability of p- and n-channel TiOx thin film transistors.
TL;DR: By varying the oxygen flow rate, the p-type γ-TiO TFT is a major breakthrough for fabricating the TiOx-based p-n combinational devices and HIPIMS offers the possibility of growing both p- and n-type conductive oxides, significantly expanding the practical usage of this technique.
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Growth and characterization of co-sputtered aluminum-gallium oxide thin films on sapphire substrates
Chao-Chun Wang,Shuo-Huang Yuan,Sin-Liang Ou,Shiau-Yuan Huang,Ku-Yen Lin,Yi-An Chen,Po-Wen Hsiao,Dong-Sing Wuu +7 more
TL;DR: In this article, the effect of DC power (0, 5, 10, 30, 50 and 70) for Al target on the structural, optical and compositional characteristics of AGO films were investigated.
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Surface evolution and effect of V/III ratio modulation on etch-pit-density improvement of thin AlN templates on nano-patterned sapphire substrates by metalorganic chemical vapor deposition
TL;DR: In this paper, a low defect-density AlN template film using V/III ratio modulation and nano-patterned sapphire substrate (NPSS) was achieved by metalorganic chemical vapor deposition.
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p-type conductive NiOx: Cu thin films with high carrier mobility deposited by ion beam assisted deposition
TL;DR: In this article, a transparent conductive NiO thin film with 18 at.% Cu dopant was fabricated by ion beam assisted deposition (IBAD) and its structural and optoelectronic properties were compared with undoped NiO films and NiO:Cu (18 at.%) films.