Soichiro Handa

Bio: Soichiro Handa is an academic researcher from Osaka University. The author has contributed to research in topics: Wavefront & Adaptive optics. The author has an hindex of 9, co-authored 24 publications receiving 832 citations.

Breaking the 10 nm barrier in hard-X-ray focusing

Abstract: X-ray sources such as free-electron lasers offer the potential to study matter at unprecedented spatial and temporal resolution. But that potential is limited by the poor quality of conventional X-ray optical elements. An in situ technique that corrects for wavefront aberrations and allows X-rays to be focused to a spot just 7 nm wide could provide a solution.

Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

Abstract: We have constructed an extremely precise optical system for hard-x-ray nanofocusing in a synchrotron radiation beamline. Precision multilayer mirrors were fabricated, tested, and employed as Kirkpatrick–Baez mirrors with a novel phase error compensator. In the phase compensator, an at-wavelength wavefront error sensing method based on x-ray interferometry and an in situ phase compensator mirror, which adaptively deforms with nanometer precision, were developed to satisfy the Rayleigh criterion to achieve diffraction-limited focusing in a single-nanometer range. The performance of the optics was tested at BL29XUL of SPring-8 and was confirmed to realize a spot size of approximately 7 nm.

At-wavelength figure metrology of hard x-ray focusing mirrors

Abstract: We have developed an at-wavelength wave-front metrology of a grazing-incidence focusing optical systems in the hard x-ray region. The metrology is based on numerical retrieval from the intensity profile around the focal point. We demonstrated the at-wavelength metrology and estimated the surface figure error on a test mirror. An experiment for measuring the focusing intensity profile was performed at the 1-km-long beamline (BL29XUL) of SPring-8. The obtained results were compared with the profile measured using an optical interferometer and were confirmed to be in good agreement with it. This technique is a potential method of characterizing wave-front aberrations on elliptical mirrors for sub-10-nm focusing.

Direct determination of the wave field of an x-ray nanobeam

Abstract: We present a remarkably accurate method for determining the wave field of an x-ray nanobeam. The intensity profile of a beam was directly measured over a range of three orders of magnitude while its phase distribution was successfully recovered using an iterative algorithm. The evolution of the wave field along the beam propagation direction was precisely simulated, and there was good agreement with the experimental results.

Highly accurate differential deposition for X‐ray reflective optics

Abstract: We have developed a highly accurate differential deposition system for the fabrication of X-ray optical devices. Using this system, thin films having a thickness distribution gradually changing along the longitudinal direction on a substrate surface could be produced with sub-nanometer accuracy. The surface flatness of the deposited films was confirmed by atomic force microscopy observation, and the surface was sufficiently smooth to prevent X-ray scattering on the mirror surface. A demonstration of differential deposition was performed and a Pt thin film having the desired thickness profile was successfully deposited on a 100 mm long substrate.

Extremely high-intensity laser interactions with fundamental quantum systems

Abstract: The field of laser-matter interaction traditionally deals with the response of atoms, molecules, and plasmas to an external light wave. However, the recent sustained technological progress is opening up the possibility of employing intense laser radiation to trigger or substantially influence physical processes beyond atomic-physics energy scales. Available optical laser intensities exceeding ${10}^{22}\text{ }\text{ }\mathrm{W}/{\mathrm{cm}}^{2}$ can push the fundamental light-electron interaction to the extreme limit where radiation-reaction effects dominate the electron dynamics, can shed light on the structure of the quantum vacuum, and can trigger the creation of particles such as electrons, muons, and pions and their corresponding antiparticles. Also, novel sources of intense coherent high-energy photons and laser-based particle colliders can pave the way to nuclear quantum optics and may even allow for the potential discovery of new particles beyond the standard model. These are the main topics of this article, which is devoted to a review of recent investigations on high-energy processes within the realm of relativistic quantum dynamics, quantum electrodynamics, and nuclear and particle physics, occurring in extremely intense laser fields.

Digital wavefront measuring interferometer for testing optical surfaces and lenses

Abstract: A self-scanned 1024 element photodiode array and minicomputer are used to measure the phase (wavefront) in the interference pattern of an interferometer to lambda/100. The photodiode array samples intensities over a 32 x 32 matrix in the interference pattern as the length of the reference arm is varied piezoelectrically. Using these data the minicomputer synchronously detects the phase at each of the 1024 points by a Fourier series method and displays the wavefront in contour and perspective plot on a storage oscilloscope in less than 1 min (Bruning et al. Paper WE16, OSA Annual Meeting, Oct. 1972). The array of intensities is sampled and averaged many times in a random fashion so that the effects of air turbulence, vibrations, and thermal drifts are minimized. Very significant is the fact that wavefront errors in the interferometer are easily determined and may be automatically subtracted from current or subsequent wavefrots. Various programs supporting the measurement system include software for determining the aperture boundary, sum and difference of wavefronts, removal or insertion of tilt and focus errors, and routines for spatial manipulation of wavefronts. FFT programs transform wavefront data into point spread function and modulus and phase of the optical transfer function of lenses. Display programs plot these functions in contour and perspective. The system has been designed to optimize the collection of data to give higher than usual accuracy in measuring the individual elements and final performance of assembled diffraction limited optical systems, and furthermore, the short loop time of a few minutes makes the system an attractive alternative to constraints imposed by test glasses in the optical shop.

X-Rays and Extreme Ultraviolet Radiation: Principles and Applications

Abstract: This self-contained, comprehensive book describes the fundamental properties of soft x-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft x-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include EUV lithography, biomicroscopy, spectromicroscopy, EUV astronomy, synchrotron radiation, and soft x-ray lasers. He also provides a great deal of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practicing engineers involved in semiconductor fabrication and materials science.

Nanoscale X-ray imaging

Abstract: Recent years have seen significant progress in the field of soft- and hard-X-ray microscopy, both technically, through developments in source, optics and imaging methodologies, and also scientifically, through a wide range of applications While an ever-growing community is pursuing the extensive applications of today's available X-ray tools, other groups are investigating improvements in techniques, including new optics, higher spatial resolutions, brighter compact sources and shorter-duration X-ray pulses This Review covers recent work in the development of direct image-forming X-ray microscopy techniques and the relevant applications, including three-dimensional biological tomography, dynamical processes in magnetic nanostructures, chemical speciation studies, industrial applications related to solar cells and batteries, and studies of archaeological materials and historical works of art

Reactivity of Surface Species in Heterogeneous Catalysts Probed by In Situ X-ray Absorption Techniques

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