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Soumya Dutta

Researcher at Indian Institute of Technology Madras

Publications -  45
Citations -  486

Soumya Dutta is an academic researcher from Indian Institute of Technology Madras. The author has contributed to research in topics: Field-effect transistor & Semiconductor. The author has an hindex of 9, co-authored 39 publications receiving 397 citations. Previous affiliations of Soumya Dutta include Jawaharlal Nehru Centre for Advanced Scientific Research & University of Texas at Austin.

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Gate‐Voltage Control of Optically‐ Induced Charges and Memory Effects in Polymer Field‐Effect Transistors

TL;DR: In this article, a fraction of light-induced drain current in the depletion mode of a polythiophene-based field effect transistor persists after switching off the photoexcitation, and can be erased by reversing the gate voltage (V g ).
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Conductive sub-micrometric wires of platinum-carbonyl clusters fabricated by soft-lithography.

TL;DR: Conductive wires of sub-micrometer width made from platinum-carbonyl clusters have been fabricated by solution-infilling of microchannels as in microinject molding in capillaries (MIMIC), driven by the liquid surface tension within the micrometric channels followed by the precipitation of the solute.
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Nonexponential relaxation of photoinduced conductance in organic field effect transistors

TL;DR: In this paper, the slow relaxation of the photoinduced excess charge carriers in organic metal-insulator-semiconductor field effect transistors consisting of poly(3-hexylthiophene) as the active layer is studied.
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Solution-Processed ZTO TFTs With Recessed Gate and Low Operating Voltage

TL;DR: In this paper, a patterned-gate configuration for solution-processed zinc tin oxide thin-film transistors (TFTs) was demonstrated with recessed and nonrecessed gate electrodes.
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Zinc tin oxide thin film transistor sensor

TL;DR: In this article, a thin film transistor (TFT) using zinc tin oxide (ZTO), deposited from solution, as the active material, was demonstrated, and a sol-gel method was used to deposit the film, followed by post-deposition annealing at the temperatures from 400 to 600°C.