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Srinivas V. Pietambaram

Researcher at Freescale Semiconductor

Publications -  24
Citations -  962

Srinivas V. Pietambaram is an academic researcher from Freescale Semiconductor. The author has contributed to research in topics: Tunnel magnetoresistance & Layer (electronics). The author has an hindex of 12, co-authored 24 publications receiving 927 citations.

Papers
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Journal ArticleDOI

A 4-Mb toggle MRAM based on a novel bit and switching method

TL;DR: In this paper, a 4Mb magnetoresistive random access memory (MRAM) with a novel magnetic bit cell and toggle switching mode is presented, which greatly improves the operational performance of the MRAM as compared to conventional MRAM.
Journal ArticleDOI

MgO-based tunnel junction material for high-speed toggle magnetic random access memory

TL;DR: In this paper, the first demonstration of a magnetoresistive random access memory (MRAM) circuit incorporating MgO-based magnetic tunnel junction (MTJ) material for higher performance was reported.
Patent

Amorphous alloys for magnetic devices

TL;DR: An amorphous layer of a cobalt iron-based (CoFe-based) magnetic alloy suitable for use in magnetoelectronic devices is disclosed in this paper, which is also useful in cladding applications to provide electrical flux containment for signal lines in magneto-electronic devices and as a material for fabricating write heads.
Patent

Synthetic antiferromagnet structures for use in MTJs in MRAM technology

TL;DR: In this article, a magnetic tunnel junction (MTJ), which is useful in magnetoresistive random access memories (MRAMs), has a free layer which is a synthetic antiferromagnet (SAF) structure composed of two ferromagnetic layers that are separated by a coupling layer.
Journal ArticleDOI

Exchange coupling control and thermal endurance of synthetic antiferromagnet structures for MRAM

TL;DR: In this paper, the authors developed an analysis method for evaluating thermal endurance of synthetic antiferromagnet (SAF) structures and showed that failure of the SAF can be modeled as a thermally activated diffusion process.