S
Stephen J. Pearton
Researcher at University of Florida
Publications - 1988
Citations - 62995
Stephen J. Pearton is an academic researcher from University of Florida. The author has contributed to research in topics: Dry etching & Etching (microfabrication). The author has an hindex of 104, co-authored 1913 publications receiving 58669 citations. Previous affiliations of Stephen J. Pearton include Kyungpook National University & University of Southern California.
Papers
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Sn doping of GaAs and AlGaAs by MOMBE using tetraethyltin
TL;DR: The feasibility of TESn as a Sn dopant source for GaAs and AlGaAs grown by metalorganic molecular beam epitaxy (MOMBRE) was investigated in this article.
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AlInAs/InGaAs based heterojunction bipolar transistors fabricated by electron cyclotron resonance etch
TL;DR: In this paper, a dry etch fabrication technology for high-speed AlInAs/InGaAs heterojunction bipolar transistors (HBTs) utilizing low-damage electron cyclotron resonance (ECR) CH4/H2/Ar plasma etching is detailed.
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Improvement of Off-State Stress Critical Voltage by Using Pt-Gated AlGaN/GaN High Electron Mobility Transistors
Chien-Fong Lo,Li Liu,Tsung-Sheng Kang,Ryan Davies,Brent P. Gila,Stephen J. Pearton,Ivan I. Kravchenko,Oleg Laboutin,Yu Cao,Wayne Johnson,Fan Ren +10 more
TL;DR: In this article, the critical voltage for degradation of AlGaN/GaN High Electron Mobility Transistors (HEMTs) during off-state biasing stress was significantly increased.
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Comparison of Dual-Stack Dielectric Field Plates on β-Ga2O3 Schottky Rectifiers
TL;DR: In this article, the effects of bilayer field plates with various dielectric (SiO2/SiNx, Al2O3/ SiNx and HfO 2/Si Nx) on Ga2O 3 Schottky rectifier performance were investigated.
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Activation characteristics of ion-implanted Si+ in AlGaN
TL;DR: In this paper, a multiple-energy Si+ implantation in the range 30-360 keV into Al0.13Ga0.87N for n-type doping was carried out at room temperature, followed by annealing at 1150-1375 °C for 5 min.