S
Stephen J. Pearton
Researcher at University of Florida
Publications - 1988
Citations - 62995
Stephen J. Pearton is an academic researcher from University of Florida. The author has contributed to research in topics: Dry etching & Etching (microfabrication). The author has an hindex of 104, co-authored 1913 publications receiving 58669 citations. Previous affiliations of Stephen J. Pearton include Kyungpook National University & University of Southern California.
Papers
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Journal ArticleDOI
Batch fabrication and structure of integrated GaAs-Al/sub x/Ga/sub 1-x/As field-effect transistor-self-electro-optic effect devices (FET-SEED's)
L.A. D'Asaro,L.M.F. Chirovsky,E.J. Laskowski,S.-S. Pei,R.E. Leibenguth,T.K. Woodward,M.W. Focht,Anthony L. Lentine,M. T. Asom,G.D. Guth,R. F. Kopf,J. M. Kuo,Stephen J. Pearton,G. J. Przybylek,Fan Ren,L.E. Smith +15 more
TL;DR: In this article, a smart pixel prototype field effect transistor-self-electrooptic-effect device (FET-SEED) integrated optoelectronic amplifier was demonstrated.
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Selective and nonselective wet etching of Zn 0.9 Mg 0.1 O/ZnO
Jau-Jiun Chen,Soohwan Jang,Fan Ren,Yuanjie Li,Hyun-Sik Kim,David P. Norton,Stephen J. Pearton,Andrei Osinsky,S. N. G. Chu,Jason F. Weaver +9 more
TL;DR: Wet etch rates at 25°C for Zn0.9Mg0.1O grown on sapphire substrates by pulsed laser deposition (PLD) were in the range 300-1100 nm · min−1 with HCl/H2O (5×10−3−2×10 −2 M) and 120-300 nm· min− 1 with H3PO4/H 2 O (5 × 10 −3 −2 −2 × 10−2 M), with thermal activation energies of 2 −3 kCal ·
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Carbon-doped base GaAs-AlGaAs HBT's grown by MOMBE and MOCVD regrowth
William S. Hobson,Fan Ren,Cammy R. Abernathy,Stephen J. Pearton,T. R. Fullowan,J. R. Lothian,A. S. Jordan,Leda Lunardi +7 more
TL;DR: In this paper, high-quality GaAs-AlGaAs heterojunction bipolar transistors (HBTs) in which the carbon-doped base layers (p=10/sup 10/10/s/sup 20/ cm/sup -3/, 400-800 AA thick) were grown by metalorganic molecular-beam epitaxy (MOMBE) and a subsequent regrowth using metalorganic chemical vapor deposition (MOCVD) is used to provide the n/sup +/ AlGaAs emitter and GaAs/InGaAs contact layers
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Annealing effects on electrical properties of MgZnO films grown by pulsed laser deposition
Alexander Y. Polyakov,N. B. Smirnov,A. V. Govorkov,E. A. Kozhukhova,A. I. Belogorokhov,Hyun-Sik Kim,David P. Norton,Stephen J. Pearton +7 more
TL;DR: In this article, electrical properties and deep trap spectra are reported for MgZnO(P) films grown by pulsed laser deposition on undoped n-ZnNO substrates.
Journal ArticleDOI
Low‐energy, ion‐enhanced etching of III–V’s for nanodevice applications
TL;DR: In this article, the etch masks are used to minimize parasitic resistances and capacitances resulting from the lateral separation of these contacts, and the chemistries employed for these fabrication steps are reviewed, together with examples of processing sequences for heterojunction bipolar transistors and novel microdisk lasers that may form the basis of future electronic and microphotonic circuits.