scispace - formally typeset
S

Stephen J. Pearton

Researcher at University of Florida

Publications -  1988
Citations -  62995

Stephen J. Pearton is an academic researcher from University of Florida. The author has contributed to research in topics: Dry etching & Etching (microfabrication). The author has an hindex of 104, co-authored 1913 publications receiving 58669 citations. Previous affiliations of Stephen J. Pearton include Kyungpook National University & University of Southern California.

Papers
More filters
Journal ArticleDOI

High density, low temperature dry etching in GaAs and InP device technology

TL;DR: In this paper, electron cyclotron resonance (ECR) plasma etching of GaAs, AlGaAs, and GaSb in Cl2/Ar or BCl3/Ar discharges is performed down to −30 C substrate temperature and characterized in terms of rate, anisotropy, damage introduction and near surface stoichiometry.
Journal ArticleDOI

Low-dimensional systems: Quantum wires and quantum boxes by MBE

TL;DR: In this paper, the authors used Ga+ ion implantation through e-beam written masks followed by rapid thermal annealing to define lines and boxes in MBE-grown GaAs quantum-well structures.
Journal ArticleDOI

Dry etch damage in GaAs metal-semiconductor field-effect transistors exposed to inductively coupled plasma and electron cyclotron resonance Ar plasmas

TL;DR: In this article, the effects of Ar plasma exposure on transconductance, channel sheet resistance, output resistance, and gate contact ideality factor of GaAs metal-semiconductor field effect transistors (MESFETs) were investigated using two different high-density plasma sources, namely inductively coupled plasma and electron resonance plasma.
Journal ArticleDOI

Characteristics of Be+ and O+ or H+ co‐implantation in GaAs/AlGaAs heterojunction bipolar transistor structures

TL;DR: In this article, the simultaneous formation of buried external collector and extrinsic base regions in GaAs/AlGaAs heterojunction bipolar transistor (HBT) structures by co-implantation of Be+ together with O+ or H+ ions is described.
Journal ArticleDOI

Sn doping of GaAs and AlGaAs grown by metalorganic molecular beam epitaxy

TL;DR: In this paper, the authors investigated Sn doping of GaAs and AlGaAs grown by metal-organic molecular beam epitaxy (MOMBE) by growing layers in which the Sn flux, as generated by an elemental Sn source, is periodically raised or lowered by changing the source temperature.