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Sunil Kumar

Researcher at Indian Institutes of Technology

Publications -  197
Citations -  4174

Sunil Kumar is an academic researcher from Indian Institutes of Technology. The author has contributed to research in topics: Ion & Thin film. The author has an hindex of 26, co-authored 181 publications receiving 2894 citations. Previous affiliations of Sunil Kumar include University of Delaware & Indian Institute of Science.

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Controlled drug delivery vehicles for cancer treatment and their performance.

TL;DR: The different types of materials used as delivery vehicles for chemotherapeutic agents and their structural characteristics that improve the therapeutic efficacy of their drugs are discussed and recent scientific advances in the area of chemotherapy are described.
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Antibiotic resistance in major rivers in the world: A systematic review on occurrence, emergence, and management strategies

TL;DR: The analysis of antibiotic contamination-driven resistance in global rivers provides a clear picture of the consequences in the near future, and integrons and mobile genetic elements are suggested as one of the important media for resistance gene transfer.
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Investigation on stabilization of CO 2 foam by ionic and nonionic surfactants in presence of different additives for application in enhanced oil recovery

TL;DR: In this paper, an attempt has been paid to design the suitable foaming agents (foamer) by evaluating the influence of three surfactants, five nanoparticles and several additives.
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Implementation of Neural-Network-Controlled Three-Leg VSC and a Transformer as Three-Phase Four-Wire DSTATCOM

TL;DR: In this article, a neural-network (NN)-controlled distribution static compensator (DSTATCOM) using a dSPACE processor is implemented for power quality improvement in a three-phase four-wire distribution system.
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Charging and trapping of macroparticles in near-electrode regions of fluorocarbon plasmas with negative ions

TL;DR: In this paper, the charging and trapping of macroparticles in the near-electrode region of fluorocarbon etching plasmas with negative ions is considered and the equilibrium charge and forces on particles are computed as a function of the local position in the plasma presheath and sheath.