3.2. Two-Photon Lithography (TPL) 919 4. Serial Writing with Charged Particles 920 4.1. Electron Beam Lithography 920 4.2. Ion Beam Lithography 920 4.3. Scanning Probe Resist Lithography 921 5. Microand Nanomachining 921 5.1. Focused Ion Beam 921 5.2. Scanning Probe Nanomachining 921 6. Direct Writing and Material Deposition 921 7. Moulding 922 7.1. Mould Fabrication 922 7.2. Demoulding: Mould Treatment 924 7.3. Embossing Thermoplastic Materials: Nanoimprint Lithography (NIL) 924

Fabrication approaches for generating complex micro- and nanopatterns on polymeric surfaces.

We investigate poly(methylmethacrylate) (PMMA) development processing with cold developers (4–10 °C) for its effect on resolution, resist residue, and pattern quality of sub-10 nm electron beam lithography (EBL). We find that low-temperature development results in higher EBL resolution and improved feature quality. PMMA trenches of 4–8 nm are obtained reproducibly at 30 kV using cold development. Fabrication of single-particle-width Au nanoparticle lines was performed by lift-off. We discuss key factors for formation of PMMA trenches at the sub-10 nm scale.

/pdf/sub-10-nm-electron-beam-lithography-using-cold-development-1ez0lpse16.pdf

Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

Here we introduce the existing fabrication techniques, detection methods, and related techniques for microfluidic sensing, with an emphasis on the detection techniques. A general survey and comparison of the fabrication techniques were given, including prototyping (hot embossing, inject molding, and soft lithography) and direct fabrication (laser micromachining, photolithography, lithography, and x-ray lithography) techniques. This is followed by an in-depth look at detection techniques: optical, electrochemical, mass spectrometry, as well as nuclear magnetic resonance spectroscopy-based sensing approaches and related techniques. In the end, we highlight several of the most important issues for future work on microfluidic sensing. This article aims at providing a tutorial review with both introductory materials and inspiring information on microfluidic fabrication and sensing for nonspecialists.

https://www.spiedigitallibrary.org/journals/journal-of-biomedical-optics/volume-16/issue-8/080901/Microfluidic-sensing--state-of-the-art-fabrication-and-detection/10.1117/1.3607430.pdf

Microfluidic sensing: state of the art fabrication and detection techniques.

The paper describes the state-of-the-art in replication of surface texture and topography at micro and nano scale. The description includes replication of surfaces in polymers, metals and glass. Three different main technological areas enabled by surface replication processes are presented: manufacture of net-shape micro/nano surfaces, tooling (i.e. master making), and surface quality control (metrology, inspection). Replication processes and methods as well as the metrology of surfaces to determine the degree of replication are presented and classified. Examples from various application areas are given including replication for surface texture measurements, surface roughness standards, manufacture of micro and nano structured functional surfaces, replicated surfaces for optical applications (e.g. optical gratings), and process chains based on combinations of repeated surface replication steps.

Replication of micro and nano surface geometries

This paper reviews microfluidic technologies with emphasis on applications in the fields of pharmacy, biology, and tissue engineering. Design and fabrication of microfluidic systems are discussed with respect to specific biological concerns, such as biocompatibility and cell viability. Recent applications and developments on genetic analysis, cell culture, cell manipulation, biosensors, pathogen detection systems, diagnostic devices, high-throughput screening and biomaterial synthesis for tissue engineering are presented. The pros and cons of materials like polydimethylsiloxane (PDMS), polymethylmethacrylate (PMMA), polystyrene (PS), polycarbonate (PC), cyclic olefin copolymer (COC), glass, and silicon are discussed in terms of biocompatibility and fabrication aspects. Microfluidic devices are widely used in life sciences. Here, commercialization and research trends of microfluidics as new, easy to use, and cost-effective measurement tools at the cell/tissue level are critically reviewed.

https://www.mdpi.com/2073-4360/4/3/1349/pdf

Polymer-Based Microfluidic Devices for Pharmacy, Biology and Tissue Engineering

Deep x-ray lithography is a fabrication method for the production of microstructures with aspect ratios of up to 100 in up to several millimeter thick resist layers. Usually, poly(methylmethacrylate) is used as the resist layer. We have measured the molecular weight and developing rates of crosslinked and noncrosslinked PMMA foils at different GG developer temperatures for dose values between 0.1 and 8 kJ/cm3. The determined developing rates cover a region of 7 orders of magnitude: With decreasing temperature the contrast of the resist-developer system and the limit of the developing dose are increased. Crosslinked PMMA has a higher contrast compared to noncrosslinked material. These effects lead to an enhanced quality of microstructures, which is demonstrated by the grating of the LIGA microspectrometer.

Influence of developer temperature and resist material on the structure quality in deep x-ray lithography

Deep X-ray lithography processing of SU-8 negative resist layers with thicknesses of up to 1 mm and physical-chemical properties of SU-8 polymer structures were investigated to find the optimum conditions for the fabrication of X-ray refractive lenses. The exposure was carried out at the ANKA storage ring in Karlsuhe, Germany. Experimental tests of the lenses were performed at the ESRF in Grenoble, France. First lenses showed a gain in the range of 20, a full width at half maximum of the focal spot intensity of approximately 2 μm to 3 μm and unique radiation stability of the optical characteristics.

Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

In deep X-ray lithography synchrotron radiation is applied to pattern several hundred micrometer thick resist layers. This technique has been used to obtain micro structures with an aspect ratio up to 100 and dimensions in the micrometer range. The structures are characterised by straight walls and a typical sidewall roughness of approximately 50 nm.

Characterisation of defects in very high deep-etch X-ray lithography microstructures

In the first step of the LIGA process a resist layer, typically PMMA (polymethylmethacrylate), is pattered by deep X-ray lithography. The exposed parts are subsequently dissolved by an organic developer. The quality and the achievable height of the microstructure is decisively determined by the development process. In order to increase the aspect ratio and maintain the quality of the microstructures the parameters influencing the development process were investigated. In the case of dip development and ultrasound development a strong dependency of the development rate on the temperature, dose value and depth of deposition has been noticed. The development rate increases with increasing dose value and temperature and decreases with increasing depth of deposition. In case of dip development the development course can be described by a phenomenological equation which considers the three mentioned parameters. In the case of ultrasound further parameters have to be taken into account: the geometry and the dimensions of the strucutres.

New development strategies for high aspect ratio microstructures

Extensive testing of populations against COVID-19 has been suggested as a game-changer quest to control the spread of this contagious disease and to avoid further disruption in our social, healthcare and economical systems. Nonetheless, testing millions of people for a new virus brings about quite a few challenges. The development of effective tests for the new coronavirus has become a worldwide task that relies on recent discoveries and lessons learned from past outbreaks. In this work, we review the most recent publications on microfluidics devices for the detection of viruses. The topics of discussion include different detection approaches, methods of signalling and fabrication techniques. Besides the miniaturization of traditional benchtop detection assays, approaches such as electrochemical analyses, field-effect transistors and resistive pulse sensors are considered. For emergency fabrication of quick test kits, the local capabilities must be evaluated, and the joint work of universities, industries, and governments seems to be an unequivocal necessity.

https://royalsocietypublishing.org/doi/pdf/10.1098/rspa.2020.0398

Sven Achenbach

Papers

Influence of developer temperature and resist material on the structure quality in deep x-ray lithography

Fabrication and preliminary testing of X-ray lenses in thick SU-8 resist layers

Characterisation of defects in very high deep-etch X-ray lithography microstructures

New development strategies for high aspect ratio microstructures

Microfluidic devices for the detection of viruses: aspects of emergency fabrication during the COVID-19 pandemic and other outbreaks