Takashi Hanada

Bio: Takashi Hanada is an academic researcher from Tohoku University. The author has contributed to research in topics: Molecular beam epitaxy & Epitaxy. The author has an hindex of 24, co-authored 143 publications receiving 1986 citations. Previous affiliations of Takashi Hanada include Synchrotron Radiation Center.

Origin of forward leakage current in GaN-based light-emitting devices

Abstract: The authors fabricated GaN-based light-emitting diodes (LEDs) on two different GaN templates with the same LED structure. One on thin GaN template (∼2μm) with high dislocation density [low (109cm−2)] grown by metal-organic vapor-phase epitaxy (sample A) and the other on thick GaN template (∼20μm) with comparatively low dislocation density [high (108cm−2)] by hydride vapor-phase epitaxy (sample B). In order to understand the mechanism of leakage current in LEDs, the correlation between current-voltage characteristics and etch pit density of LEDs was studied.

Band alignment at a ZnO/GaN (0001) heterointerface

Abstract: We report the experimental results of the valence band offset at a ZnO/GaN (0001) heterointerface. The ZnO/GaN (0001) heterointerface is prepared by growing a ZnO layer on (0001) GaN/Al2O3, in which the ZnO layer is epitaxially deposited by plasma-assisted molecular-beam epitaxy, while the GaN template is prepared by metalorganic chemical-vapor deposition. Ex situ ultraviolet and x-ray photoelectron spectroscopy have been used to measure the valence band offset ΔEV. The photoelectron spectroscopy measurements are done before and after Ar+ ion cleaning of the surfaces. Type-II band alignments with band offsets of ΔEV=1.0 eV (before cleaning) and 0.8 eV (after cleaning) with the valence band maximum of GaN being placed above that of ZnO are obtained.

Structural variation of cubic and hexagonal MgxZn1−xO layers grown on MgO(111)∕c-sapphire

Abstract: We report on the structure study of MgxZn1−xO films and, in particular, we will focus on MgxZn1−xO layers with x=0.28 and 0.41 MgxZn1−xO layers with different crystal structures of cubic and wurtzite that have been grown by plasma-assisted molecular-beam epitaxy on MgO∕c-sapphire with Mg∕Zn flux ratio control. The MgxZn1−xO films have been characterized by high-resolution transmission electron microscopy (HRTEM) and high-resolution x-ray diffraction. The dependence of the cation-anion bond length to Mg content has been studied. A virtual crystal model of MgZnO has been applied to interpret the bond-length variation. HRTEM results indicate that the initial stage of the MgZnO growth on a MgO buffer layer starts with a cubic structure even in the case of a wurtzite structure at the end of growth.

Control of crystal polarity in a wurtzite crystal: ZnO films grown by plasma-assisted molecular-beam epitaxy on GaN

Abstract: ZnO/GaN heterointerfaces are engineered to control the polarity of ZnO films grown by plasma-assisted molecular beam epitaxy on Ga-polar GaN templates. The polarity of ZnO films is determined both by coaxial impact collision ion scattering spectroscopy (CAICISS) and by convergent beam electron diffraction (CBED). Polarity inversion can be achieved by inserting an interface layer with a center of symmetry, because the polarity comes from a lack of the center of symmetry. An O-polar (anion-polar) ZnO film can be grown on Ga-polar (cation-polar) GaN by inserting a ${\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$ layer at the interface, while Zn-polar ZnO is grown on GaN without forming an interface layer. A single-crystalline monoclinic ${\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$ layer, which has a center of symmetry, is formed by O-plasma preexposure on the Ga-polar GaN surface prior to ZnO growth, while the ZnO/GaN interface without any extra layer is formed by Zn preexposure. The orientation relationship between ZnO, ${\mathrm{Ga}}_{2}{\mathrm{O}}_{3},$ and GaN is determined as $[2\ensuremath{-}1\ensuremath{-}10{]}_{\mathrm{ZnO}}\ensuremath{\parallel}[010{]}_{{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}}\ensuremath{\parallel}[2\ensuremath{-}1\ensuremath{-}10{]}_{\mathrm{GaN}}$ and ${(0001)}_{\mathrm{ZnO}}\ensuremath{\parallel}{(001)}_{{\mathrm{Ga}}_{2}{\mathrm{O}}_{3}}\ensuremath{\parallel}{(0001)}_{\mathrm{GaN}}.$ The CAICISS results reveal the growth of an O-polar ZnO film on O-plasma-preexposed GaN, while a Zn-polar ZnO film on Zn-preexposed GaN. The origin of the observed features in polar-angle-dependent CAICISS spectra can be analyzed by considering the shadow cones of Zn and O atoms formed by incident ions and shadowing and focusing effects of scattered ions. Azimuthal-angle-dependent CAICISS spectra reveal the surfaces of both Zn- and O-polar ZnO films as mixture of c and $c/2$ planes with a ratio of about 50:50. The ZnO film with a ${\mathrm{Ga}}_{2}{\mathrm{O}}_{3}$ interface layer shows a degradation in the crystal quality as evidenced by a broadening of the x-ray rocking curves. The CBED results for the O-plasma-preexposed samples reveal Ga-polar GaN and O-polar ZnO for the O-plasma-preexposed samples, which directly confirms polarity inversion from cation to anion polar. On the other hand, Zn-polar ZnO CBED patterns are obtained from ZnO films grown on Zn-preexposed Ga-polar GaN, which indicates the same cation polarity for a ZnO/GaN interface without the formation of an interface layer. It is noted that no planar or faceted inversion domain boundaries are formed to invert the polarity (from Ga polar to O polar). This indicates that we can control the polarity by engineering interfaces.

A comprehensive review of zno materials and devices

Abstract: The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. ...

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Abstract: Atomic layer deposition(ALD), a chemical vapor deposition technique based on sequential self-terminating gas–solid reactions, has for about four decades been applied for manufacturing conformal inorganic material layers with thickness down to the nanometer range. Despite the numerous successful applications of material growth by ALD, many physicochemical processes that control ALD growth are not yet sufficiently understood. To increase understanding of ALD processes, overviews are needed not only of the existing ALD processes and their applications, but also of the knowledge of the surface chemistry of specific ALD processes. This work aims to start the overviews on specific ALD processes by reviewing the experimental information available on the surface chemistry of the trimethylaluminum/water process. This process is generally known as a rather ideal ALD process, and plenty of information is available on its surface chemistry. This in-depth summary of the surface chemistry of one representative ALD process aims also to provide a view on the current status of understanding the surface chemistry of ALD, in general. The review starts by describing the basic characteristics of ALD, discussing the history of ALD—including the question who made the first ALD experiments—and giving an overview of the two-reactant ALD processes investigated to date. Second, the basic concepts related to the surface chemistry of ALD are described from a generic viewpoint applicable to all ALD processes based on compound reactants. This description includes physicochemical requirements for self-terminating reactions,reaction kinetics, typical chemisorption mechanisms, factors causing saturation, reasons for growth of less than a monolayer per cycle, effect of the temperature and number of cycles on the growth per cycle (GPC), and the growth mode. A comparison is made of three models available for estimating the sterically allowed value of GPC in ALD. Third, the experimental information on the surface chemistry in the trimethylaluminum/water ALD process are reviewed using the concepts developed in the second part of this review. The results are reviewed critically, with an aim to combine the information obtained in different types of investigations, such as growth experiments on flat substrates and reaction chemistry investigation on high-surface-area materials. Although the surface chemistry of the trimethylaluminum/water ALD process is rather well understood, systematic investigations of the reaction kinetics and the growth mode on different substrates are still missing. The last part of the review is devoted to discussing issues which may hamper surface chemistry investigations of ALD, such as problematic historical assumptions, nonstandard terminology, and the effect of experimental conditions on the surface chemistry of ALD. I hope that this review can help the newcomer get acquainted with the exciting and challenging field of surface chemistry of ALD and can serve as a useful guide for the specialist towards the fifth decade of ALD research.

Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends

Abstract: Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely suitable for depositing uniform and conformal films on complex three-dimensional topographies. The deposition of a film of a given material by ALD relies on the successive, separated, and self-terminating gas–solid reactions of typically two gaseous reactants. Hundreds of ALD chemistries have been found for depositing a variety of materials during the past decades, mostly for inorganic materials but lately also for organic and inorganic–organic hybrid compounds. One factor that often dictates the properties of ALD films in actual applications is the crystallinity of the grown film: Is the material amorphous or, if it is crystalline, which phase(s) is (are) present. In this thematic review, we first describe the basics of ALD, summarize the two-reactant ALD processes to grow inorganic materials developed to-date, updating the information of an earlier review on ALD [R. L. Puurunen, J. Appl. Phys. 97, 121301 (2005)], and give an overview of the status of processing ternary compounds by ALD. We then proceed to analyze the published experimental data for information on the crystallinity and phase of inorganic materials deposited by ALD from different reactants at different temperatures. The data are collected for films in their as-deposited state and tabulated for easy reference. Case studies are presented to illustrate the effect of different process parameters on crystallinity for representative materials: aluminium oxide, zirconium oxide, zinc oxide, titanium nitride, zinc zulfide, and ruthenium. Finally, we discuss the general trends in the development of film crystallinity as function of ALD process parameters. The authors hope that this review will help newcomers to ALD to familiarize themselves with the complex world of crystalline ALD films and, at the same time, serve for the expert as a handbook-type reference source on ALD processes and film crystallinity.

31p-S-4 Giant Magnetoresistance in Magnetic Manganese Oxide with Intrinsic Antiferromagnetic Spin Structure

Abstract: Giant and isotropic magnetoresistance as huge as −53% was observed in magnetic manganese oxide La0.72Ca0.25MnOz films with an intrinsic antiferromagnetic spin structure. We ascribe this magnetoresistance to spin‐dependent electron scattering due to spin canting of the manganese oxide.

ZnO : From basics towards applications

Abstract: Several hundred thousands of tons of ZnO are used by per year, e.g. as an additive to concrete or to rubber. In the field of optoelectronics, ZnO holds promises as a material for a blue/UV optoelectronics, alternatively to GaN, as a cheap, transparent, conducting oxide, as a material for electronic circuits, which are transparent in the visible or for semiconductor spintronics. The main problem is presently, however, a high, reproducible and stable p-doping. We review in this contribution partly critically the material growth, fundamental properties of ZnO and of ZnO-based nanostructures, doping as well as present and future applications, with emphasis on the electronic and optical properties including stimulated emission. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)