T
Takeshi Kinsho
Researcher at Shin-Etsu Chemical
Publications - 123
Citations - 1605
Takeshi Kinsho is an academic researcher from Shin-Etsu Chemical. The author has contributed to research in topics: Resist & Alkyl. The author has an hindex of 22, co-authored 123 publications receiving 1600 citations. Previous affiliations of Takeshi Kinsho include IBM.
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Patent
Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
TL;DR: A polymerizable anion-containing sulfonium salt having formula (1) is provided in this article, wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl, arralyl or arynoxoalky, or two of R 2, R 3 and R 4 may bond together to form a ring with S, A is a
Patent
Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
TL;DR: Sulfonate salts have the formula: HOCH 2 CH 2 CF 2 CF2 SO 3 − M + wherein M + is a Li, Na, K, ammonium or tetramethylammonium ion.
Patent
Photoacid generator, resist composition, and patterning process
TL;DR: The photoacid generator produces a sulfonic acid which has a bulky cyclic structure in the sulfonate moiety and a straight-chain hydrocarbon group and thus shows a controlled acid diffusion behavior and an adequate mobility.
Patent
Sulfonium salt-containing polymer, resist composition, and patterning process
TL;DR: In this paper, a recurring polymer comprising recurring units having formulae (1), (2) and (3) is provided as well as a chemically amplified resist composition comprising the same.
Patent
Positive resist compositions and patterning process
TL;DR: In this paper, a polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group with a hexafluoro alcohol group is used as a base resin to formulate a positive resist composition which when exposed to high-energy radiation and developed, exhibits a high sensitivity, a high resolution, and a minimal line edge roughness due to controlled swell during development.