Tatsuya Ariga

Bio: Tatsuya Ariga is an academic researcher from Komatsu Limited. The author has contributed to research in topics: Laser & Laser power scaling. The author has an hindex of 14, co-authored 46 publications receiving 468 citations.

Driver laser for extreme ultra violet light source device

Abstract: A driver laser for an extreme ultra violet light source device capable of suppressing self-oscillation light, amplifying a laser beam efficiently, and reducing a device size. The driver laser has an oscillator for generating a laser beam to output the generated laser beam, and at least one amplifier for amplifying the laser beam output from the oscillator to output the amplified laser beam. The amplifier includes a discharge unit which amplifies the laser beam by using energy of a laser medium excited by discharge, a feedback mirror which leads the laser beam output from the discharge unit to the discharge unit, a polarizer which leads the laser beam output from the oscillator into the discharge unit and also reflects the laser beam output from the discharge unit to a predetermined direction, and a self-oscillation light filter which attenuates self-oscillation light output from the discharge unit.

Driver laser system for extremely ultraviolet optical source apparatus

Abstract: PROBLEM TO BE SOLVED: To provide a low cost driver laser system for an EUV light source apparatus which can generate EUV light stably in a high efficiency. SOLUTION: The driver laser system 3 for the EUV light source apparatus which is configured according to an MOPA (master oscillator power amplifier) system includes laser systems for generating laser beams and controlling pulse widths of the laser beams, so that the pulse widths of the laser beams are shortened to predetermined values to amplify the laser beams in a plurality of laser amplifiers 304 (1) and 304 (2) and 305 (1) and 305 (2) arranged in parallel, and a laser system controller 4 for controlling the operation timing of the laser system so as to sequentially emit the laser beams from the plurality of the laser amplifiers. COPYRIGHT: (C)2006,JPO&NCIPI

Driver laser for extreme ultraviolet light source

Abstract: PROBLEM TO BE SOLVED: To provide a compact laser driver which can efficiently amplify laser beam and is superior in the convergence of the amplified laser beam. SOLUTION: The driver laser includes a laser oscillator which oscillates to generate laser beam, and at least one slab type laser amplifier which inputs the laser beam generated by the laser oscillator, and amplifies and outputs the laser beam, and the at least one slab type laser amplifier includes a chamber which has a first window and a second window and is filled with gas containing carbon dioxide (CO2), a pair of electrodes which are disposed in the chamber and excites the gas in a discharge formed by application of a high frequency voltage to amplify the laser beam, and an optical system which is disposed in the chamber and has a plurality of mirrors propagating the laser beam made incident from the first window in the discharge area through repetitive reflection and projecting the laser beam from the second window. COPYRIGHT: (C)2009,JPO&INPIT

Band narrowing laser

Abstract: A band narrowing laser having a band narrowing module which narrows by a band narrowing element a band of the laser beam generated from a laser medium, in which wavefront correction means ( 10 ) that corrects the wavefront of an incident laser beam and and projects the corrected beam is intalled in the band narrowing module ( 6 ) to produce a laser beam with a narrow and stable spectral line width.

2-stage laser device for exposure

Abstract: There is provided a 2-stage laser device appropriately used for a semiconductor exposure device having a high stability , a high output efficiency, and a narrow line width of the MOPO method and a low spatial coherence. The 2-stage laser device for exposure includes an oscillation stage laser (50) and an amplification stage laser (60). The oscillation stage laser (50) oscillates a laser beam having divergence. The amplification stage laser (60) includes a Fabry-Perot etalon resonator consisting of an input side mirror (1) and an output side mirror (2) and the resonator constitutes a stable resonator.

A method and system for managing a data object so as to comply with predetermined conditions for usage

Abstract: The present invention relates to a method and a system for managing a data object so as to comply with predetermined conditions for usage of the data object. To control the usage of the data object, a set of control data, defining usages of the data object which comply with the predetermined conditions, is created for the data object. The data object is concatenated with the user set of control data, encrypted and transferred to the user. When the user wants to use the data object, a special user program checks whether the usage complies with the control data. If so, the usage is enabled. Otherwise it is disabled.

Extreme ultraviolet light source apparatus

Abstract: An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.

Method and arrangement for obtaining information about vehicle occupants

Abstract: Arrangement and method for obtaining information about a vehicle occupant in a compartment of the vehicle in which a light source is mounted in the vehicle, structured light is projected into an area of interest in the compartment, rays of light forming the structured light originating from the light source, reflected light is detected at an image sensor at a position different than the position from which the structured light is projected, and the reflected light is analyzed relative to the projected structured light to obtain information about the area of interest. The structured light is designed to appear as if it comes from a source of light (virtual or actual) which is at a position different than the position of the image sensor.

Laser produced plasma euv light source

Abstract: An EUV light source is disclosed that may include a laser source, eg CO2 laser, a plasma chamber, and a beam delivery system for passing a laser beam from the laser source into the plasma chamber Embodiments are disclosed which may include one or more of the following; a bypass line may be provided to establish fluid communication between the plasma chamber and the auxiliary chamber, a focusing optic, eg mirror, for focusing the laser beam to a focal spot in the plasma chamber, a steering optic for steering the laser beam focal spot in the plasma chamber, and an optical arrangement for adjusting focal power

Physical processes in EUV sources for microlithography

Abstract: The source is an integral part of an extreme ultraviolet lithography (EUVL) tool. Such a source, as well as the EUVL tool, has to fulfil very high demands both technical and cost oriented. The EUVL tool operates at a wavelength of 13.5 nm, which requires the following new developments. The light production mechanism changes from conventional lamps and lasers to relatively high-temperature emitting plasmas. The light transport, mainly refractive for deep ultraviolet (DUV), should be reflective for EUV. The source specifications as derived from the customer requirements on wafer throughput mean that the output EUV source power has to be hundreds of watts. This in its turn means that tens to hundreds of kilowatts of dissipated power has to be managed in a relatively small volume. In order to keep lithography costs as low as possible, the lifetime of the components should be as long as possible and at least of the order of thousands of hours. This poses a challenge for the sources, namely how to design and manufacture components robust enough to withstand the intense environment of high heat dissipation, flows of several keV ions as well as the atomic and particular debris within the source vessel. As with all lithography tools, the imaging requirements demand a narrow illumination bandwidth. Absorption of materials at EUV wavelengths is extreme with extinguishing lengths of the order of tens of nanometres, so the balance between high transmission and spectral purity requires careful engineering. All together, EUV lithography sources present technological challenges in various fields of physics such as plasma, optics and material science.These challenges are being tackled by the source manufacturers and investigated extensively in the research facilities around the world.An overview of the published results on the topic as well as the analyses of the physical processes behind the proposed solutions will be presented in this paper.