T
Thomas Grille
Researcher at Infineon Technologies
Publications - 68
Citations - 405
Thomas Grille is an academic researcher from Infineon Technologies. The author has contributed to research in topics: Photonic crystal & Waveguide. The author has an hindex of 10, co-authored 60 publications receiving 303 citations.
Papers
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Journal ArticleDOI
Mid-infrared absorption gas sensing using a silicon strip waveguide
Christian Ranacher,Cristina Consani,Andreas Tortschanoff,Reyhaneh Jannesari,Markus Bergmeister,Thomas Grille,Bernhard Jakoby +6 more
TL;DR: In this article, a photonic gas sensor based on infrared evanescent field absorption, designed for CO2 sensing, was presented, and the measured transmittance at various CO2 concentrations was fitted using the Beer-Lambert law.
Journal ArticleDOI
Characterization of Evanescent Field Gas Sensor Structures Based on Silicon Photonics
Christian Ranacher,Cristina Consani,Natalie Vollert,Andreas Tortschanoff,Markus Bergmeister,Thomas Grille,Bernhard Jakoby +6 more
TL;DR: In this paper, a photonic gas sensor concept based on silicon waveguides using infrared evanescent field absorption was presented, specifically designed for CO $2$ sensing at a wavelength of $\lambda ={\text{4.26}},\mathrm{\mu m}$ as possible application for the proposed sensor platform.
Journal ArticleDOI
Mid-infrared photonic gas sensing using a silicon waveguide and an integrated emitter
Cristina Consani,Christian Ranacher,Andreas Tortschanoff,Thomas Grille,Peter Irsigler,Bernhard Jakoby +5 more
TL;DR: In this article, the authors demonstrate the feasibility of gas detection using a silicon waveguide and a low-cost integrated thermal emitter, using the first demonstrators they achieved CO2 detection with a confidence level of three standard deviations.
Journal ArticleDOI
Inductively-coupled plasma-enhanced chemical vapour deposition of hydrogenated amorphous silicon carbide thin films for MEMS☆
TL;DR: In this article, the impact of various deposition parameters such as the reactive gas flow ratio, plasma power, substrate temperature and chamber back pressure of ICP-CVD deposited a-SiC:H thin films is investigated and the influence on important MEMS-related properties like residual stress, Young's modulus, hardness, mass density and refractive index is evaluated.
Patent
Method for Fabricating a Cavity Structure, for Fabricating a Cavity Structure for a Semiconductor Structure and a Semiconductor Microphone Fabricated by the Same
TL;DR: In this paper, the authors describe a method for fabricating a cavity structure, a semiconductor structure, and a cavity-structured microphone using a first layer, depositing a carbon layer on the first layer and covering the carbon layer with a second layer to define the cavity structure.