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V. Damodara Das

Researcher at Indian Institute of Technology Madras

Publications -  89
Citations -  1184

V. Damodara Das is an academic researcher from Indian Institute of Technology Madras. The author has contributed to research in topics: Thin film & Electrical resistivity and conductivity. The author has an hindex of 20, co-authored 89 publications receiving 1145 citations.

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Modified equations for the evaluation of energy distribution of defects in as‐grown thin films by Vand’s theory

TL;DR: In this paper, it was shown that the use of Vand's original equations for the evaluation of defect density distribution in energy in as-grown thin films lead to results which are in error by at least 6% in the case of thin films vacuum deposited at room temperature.
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Thickness and temperature dependence of electrical properties of Bi2(Te0.1Se0.9)3 thin films

TL;DR: In this article, thin films of different thicknesses have been vacuum deposited onto clean glass plates held at room temperature using the flash evaporation technique in a vacuum of 2×10−5 Torr.
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Optical and photoluminescence studies of gold nanoparticles embedded ZnO thin films

TL;DR: In this paper, a thin thermally evaporated Au film between two sputtered ZnO films was used to obtain high resolution transmission electron microscopy (HRTEM), glancing angle X-ray diffraction (GXRD), optical absorption and photoluminescence (PL) measurements.
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Characterization of stepwise flash-evaporated CuInSe2 films

TL;DR: In this paper, the phase purity and microstructure of polycrystalline films were analyzed by transmission electron microscopy, and it was shown that films grown at 300 K and below were amorphous, whereas those grown at 370 K and above were polycrystaline in nature.
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Defect density variation with deposition rate in snsb thin films from annealing study of electrical resistance

TL;DR: In this paper, the initial lattice distortion energy spectra of SnSb thin films of the same thickness (600 A) vacuum deposited at room temperature on glass substrates at various deposition rates were heated to a maximum temperature of about 300°C and the changes in the electrical resistance with temperature were recorded.